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Preparation method of patterned ultraviolet shielding film

A patterning and external shielding technology, applied in semiconductor/solid-state device manufacturing, electrical components, nanotechnology, etc., can solve problems such as high substrate requirements and inability to apply polymer substrates

Inactive Publication Date: 2011-12-14
GRADUATE SCHOOL OF THE CHINESE ACAD OF SCI GSCAS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these methods require high temperature processing and have high requirements on the substrate, so they cannot be applied to polymer substrates.

Method used

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  • Preparation method of patterned ultraviolet shielding film
  • Preparation method of patterned ultraviolet shielding film
  • Preparation method of patterned ultraviolet shielding film

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Experimental program
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preparation example Construction

[0031] Such as figure 1 As shown, the method for preparing a patterned ultraviolet shielding film according to an embodiment of the present invention includes the following steps: A) providing a substrate; B) setting a hybrid patterned template with a hydrophilic pattern and a hydrophobic pattern on the surface of the substrate C) setting a shielding agent layer on the surface of the patterned template, the shielding agent being an amphiphilic surfactant with a linear structure; D) liquid-phase deposition of an ultraviolet shielding film on the template modified with the shielding agent; and E ) removing the ultraviolet shielding film deposited on the surface of the hydrophobic pattern to obtain a patterned ultraviolet shielding film.

[0032] Below, each step is described in detail.

[0033] A) Provide the substrate.

[0034] There is no particular limitation on the material of the substrate, for example, it may be formed of a silicon-based substrate, a metal substrate, a g...

example 1

[0073] 1. Provide substrate

[0074] Sonicate the polyethylene terephthalate (PET) substrate in appropriate amount of water, ethanol, and acetone in sequence, and then bake it at 90-120 degrees Celsius for 1-30 minutes to clean the surface of the substrate.

[0075] 2. A patterned template for hybridization of hydrophilic patterns and hydrophobic patterns is set on the surface of the substrate

[0076] 2.1. Form a silicon-based buffer layer on the surface of the substrate, and make the terminal group of the silicon-based buffer layer be hydroxyl

[0077] The cleaned substrate is immersed in an acetone solution of aminopropylsilane and left to stand for 1-20 minutes, washed twice with acetone after being taken out, baked at 90-120 degrees Celsius for 1-30 minutes, and irradiated with ultraviolet light for 1-30 minutes.

[0078] This step realizes the assembly of the silicon-based buffer layer on the PET substrate, and the terminal groups of the silicon-based buffer layer are h...

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PUM

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Abstract

The invention discloses a patterned ultraviolet screening film preparation method which comprises the following steps: (a) providing a substrate; (b) providing a patterned template of a hydrophilic pattern and a hydrophobicity pattern hybrid; (c) providing a screener layer on a surface of the patterned template, wherein the screener is a linear structure amphiphilic surfactant; (d) depositing a ultraviolet screening film on the template with liquid phase deposition; (e) removing the ultraviolet screening film deposited on a hydrophobicity pattern surface, and obtaining the patterned ultraviolet screening film. According to the patterned ultraviolet screening film preparation method of the invention, preparation of the patterned ultraviolet screening film on various substrates is realized. The method has the characteristics of a simple operation, a mild condition, strong adaptability to a substrate, no need of a special apparatus and equipment, wide application range and the like.

Description

technical field [0001] The invention relates to the technical field of nano-device preparation, in particular to a method for preparing a patterned ultraviolet shielding film. Background technique [0002] Many scientists are working on the integration of nano-functional materials in electronic and optical systems. Among a large number of studied materials, metal oxide UV-shielding films have attracted extensive attention due to their strong UV absorption, photoluminescence, photocatalysis, photoelectric conversion, etc. The patterned metal oxide ultraviolet shielding film can be applied to ultraviolet filters of nanometer devices, semiconductor protective films, thin film transistors, solar cells, and the like. [0003] The traditional method of assembling micropatterns of metal oxide UV shielding films is by etching inorganic functional films, but it is very difficult to obtain high-resolution patterns by this method, and the substrate is also easily damaged. [0004] In...

Claims

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Application Information

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IPC IPC(8): H01L21/02B82Y40/00
Inventor 向军辉梁小红邢丽宋波陈世伟赵春林赛华征
Owner GRADUATE SCHOOL OF THE CHINESE ACAD OF SCI GSCAS