Birefringence detection device and detection method based on sinusoidal modulation of light intensity of light source

A technology of sinusoidal modulation and detection device, which is used in measurement devices, material analysis by optical means, instruments, etc., can solve the problem that measurement accuracy is affected by DC noise and other issues, and achieve the effect of high signal-to-noise ratio.

Inactive Publication Date: 2011-12-21
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0011] The present invention aims to solve the problem that the measurement accuracy of the above-mentioned prior art is affected by DC noise (DC term, trend term, nonlinear amplification, etc.), and provides a birefringence detection device and detection method based on sinusoidal modulation of the light intensity of the light source. The measurement is not affected by DC noise, resulting in high-precision birefringence detection results

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  • Birefringence detection device and detection method based on sinusoidal modulation of light intensity of light source
  • Birefringence detection device and detection method based on sinusoidal modulation of light intensity of light source
  • Birefringence detection device and detection method based on sinusoidal modulation of light intensity of light source

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[0036] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0037] see first figure 1 , figure 1 It is a structural schematic diagram of the birefringence detection device of the present invention. It can be seen from the figure that the birefringence detection device based on the sinusoidal modulation of the light intensity of the light source of the present invention comprises a light source 1 sequentially arranged along the optical axis of the device system, and the sinusoidal modulation frequency of the light intensity is ω 0 The light intensity modulator 2 and its sinusoidal modulation signal generator 10, the polarizer 3 with a light transmission axis angle of 45°, a fast axis angle of 0°, and a peak delay δ 10 =2.405rad, the modulation frequency is ω 1 The first photoelastic modulator 4, the measured object 5, the fast a...

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Abstract

A birefringence detection device and detection method based on the sinusoidal modulation of the light intensity of a light source, wherein the sinusoidally modulated laser beam passes through a polarizer, a first photoelastic modulator, a measured object, a second photoelastic modulator and After the polarizer is detected by a photoelectric detector, the signal detected by the photodetector is processed to obtain a harmonic signal, and the delay δ of the birefringence of the measured object and the main axis angle ρ are obtained from the harmonic signal. The measurement result of the invention is not affected by DC noise (DC item, trend item, nonlinear amplification, etc.), and can measure the birefringence of low transmittance optical materials while ensuring accuracy.

Description

technical field [0001] The invention relates to a birefringence detection device, in particular to a birefringence detection device and a detection method based on sinusoidal modulation of light intensity of a light source. Background technique [0002] The semiconductor industry's demand for high-speed microchips has led to shorter and shorter beam wavelengths used in lithography. Today, the wavelength used in high-end lithography has entered the deep ultraviolet (DUV) band, reaching 193nm. Optional optical materials in the DUV band include Fused Silica and CaF 2 , the former has a small coefficient of thermal expansion, but relatively low transmittance (~80%), and is suitable as a photolithography mask substrate material; the latter has a high transmittance, and is currently the only practical DUV lithography lens material, but CaF 2 Birefringence exists in the DUV band. The birefringence of materials in optical components can lead to light splitting, wavefront distortio...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/23
Inventor 杨朝兴李中梁王向朝
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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