Preparation method of photonic crystal multilayer film
A photonic crystal and multi-layer film technology, applied in coating, ion implantation plating, metal material coating process, etc., can solve the problems of less research, large energy, loss, etc.
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[0068] The present invention will be further described below in conjunction with accompanying drawing:
[0069] figure 1 As shown, it is the state diagram of photonic crystal multilayer film magnetron sputtering. The position and connection relationship of each part must be correct, and the ratio should be adjusted according to the quantity, and the operation should be performed in sequence.
[0070] The amount of chemical substances used in the preparation is determined according to the preset range in millimeters, milliliters, centimeters 3 is the unit of measurement.
[0071] The preparation of the photonic crystal multilayer film is carried out in a magnetron sputtering furnace. The lower part of the magnetron sputtering furnace 1 is a furnace base 2, and a display screen 4 and an indicator light 5 are arranged on the front control panel of the furnace base 2. , power switch 6, titanium oxide target source controller 7, copper target source controller 8, vacuum pump swit...
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