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Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber

A technology of chemical vapor deposition and multi-layer products, which is applied in the direction of gaseous chemical plating, coating, metal material coating technology, etc., can solve the problems of low production efficiency, high production cost, increased output, etc., and achieve production efficiency and cost Improve savings, increase production efficiency, and increase the effect of product quantity

Active Publication Date: 2013-06-19
山东国晶新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Now most of them focus on the single-layer fixture design that can not only ensure the coating quality, but also increase the number of products. However, due to the influence of objective conditions such as the diameter of the furnace, the increase in output is very limited simply by adding brackets.
Generally speaking, the design and use of fixtures with various single-layer structures, the number of products in single-furnace production is still small, the production efficiency is low, and the production cost is high.

Method used

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  • Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber
  • Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber
  • Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber

Examples

Experimental program
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Effect test

Embodiment 1

[0038] A multi-layer product support for chemical vapor deposition, with a structure such as figure 1 , figure 2 As shown, it includes a unit layer composed of a round sleeve 1, an air distribution plate 2 and a support rod 3; the structure of the unit layer is that the air distribution plate 2 is placed on a round sleeve 1, and the outer diameter of the round sleeve 1 and the cloth The gas disc 2 has the same diameter. The support rod 3 is fixed upright on the air distribution plate 2, and a round sleeve 1 of another unit layer is placed on the air distribution plate 2 of one unit layer, and a total of 3 unit layers are placed in combination; wherein, the round sleeve The upper part of the wall of the cylinder 1 is symmetrically provided with two rectangular notches 5 as gas circulation channels; the support rod is a tungsten needle, the bottom end of the tungsten needle is fixed in the recess hole on the air distribution plate, and the tip of the tungsten needle is needle-sha...

Embodiment 2

[0042] A multi-layer product support for chemical vapor deposition, as described in Example 1, the difference is that there are 4 unit layers; wherein, the upper part of the wall of the circular sleeve 1 is symmetrically provided with two arc-shaped notches as Gas circulation channel; the tungsten needles fixed on the gas distribution plate are supported by 4 tungsten needles according to each substrate. The round sleeve is made of graphite with a wall thickness of 8 mm and a height of 25 mm from the top of the substrate to the air distribution plate of another unit layer after the tungsten needle is fixed on the air distribution plate to support the substrate.

Embodiment 3

[0044] A chemical vapor deposition reaction chamber, comprising a reaction chamber cavity 7 and the multi-layer product support described in Example 1. The multi-layer product support is placed on the air inlet 9 in the cavity and the air inlet gas plate 8 Above, the air inlet 9 is located at the bottom of the reaction chamber, and the air outlet 10 and the air inlet 9 are located at the top of the reaction chamber opposite to each other. Used as a chemical vapor deposition equipment with a vacuum of 200-5000 Pa.

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Abstract

The present invention relates to a multi-layer product support for vapor deposition, and a chemical vapor deposition reaction chamber. The multi-layer product support comprises unit layers, wherein the unit layer comprises a round sleeve, a gas distribution disk and a support rod. The structure of the unit layer is characterized in that: the gas distribution disk is arranged on the round sleeve; the support rod is vertically fixed on the gas distribution disk, and is provided for supporting a substrate requiring coating; the round sleeve of the one unit layer is placed on the gas distributiondisk of the other unit layer; the upper part of the round sleeve wall is symmetrically provided with two notches, wherein the gas can conveniently flow by the notches. According to the chemical vapordeposition reaction chamber, the multi-layer product support is placed on an incoming gas distribution plate on the gas inlet inside the cavity; the gas inlet is positioned on the bottom of the reaction chamber; the position of the gas outlet is relative to the position of the gas inlet, and the gas outlet is positioned on the top of the reaction chamber. The quality of the coating product produced by the multi-layer product support of the present invention is uniform, the number of the coating product is increased by several times, and the production efficiency is improved.

Description

Technical field [0001] The invention relates to a production fixture in a vapor deposition chamber, in particular to a multi-layer product support for production in a vapor deposition furnace with a multilayer structure and a chemical vapor deposition reaction chamber. Background technique [0002] The chemical vapor deposition (CVD) method is considered to be the most promising method for the preparation of silicon carbide coatings, because it has excellent adaptability to parts with complex shapes and inner surfaces, and can be prepared at relatively low temperatures. . [0003] Xinwang Magnetic Materials Co., Ltd. applied for an application number 200510004777.6 on September 29, 1999, and the name is "product support used in vapor deposition equipment". The product holder mainly supports a flat sample. The product holder of the present invention includes a tubular body, the inner diameter of the body is configured to hold the product, and the body is made of stainless steel wir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/458C23C16/32C23C16/42
Inventor 刘汝萃刘汝强
Owner 山东国晶新材料有限公司