Method for producing multilayer film blazed grating based on electron beam lithography and X-ray exposure
A technology of electron beam lithography and blazed grating, which is applied in microlithography exposure equipment, diffraction grating, photolithographic process exposure device, etc. inefficient effect
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[0030] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0031] The invention uses electron beams to directly write the X-ray exposure mask, uses contact exposure, adjusts the direction of the exposure fixture to change the incident angle of X-rays, forms a blazed grating pattern on the negative photoresist, and then grows a multilayer film on the pattern , forming a multilayer film blazed grating.
[0032] Such as figure 1 as shown, figure 1 It is a flow chart of the method for making multilayer blazed gratings based on electron beam lithography and X-ray exposure provided by the present invention. The method uses electron beam direct writing to make X-ray exposure mask plates, and uses contact exposure. A blazed grating pattern is formed on the pattern, and then a multilaye...
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