Ray sensitive resin composition, curing film used for display element, forming method for curing film used for display element, and display element

A technology of resin composition and display element, applied in nonlinear optics, pattern-surface photoengraving process, optics, etc., can solve problems such as decreased storage stability, and achieve excellent curability, excellent light transmittance, and voltage retention. Excellent rate

Inactive Publication Date: 2012-07-04
JSR CORPORATIOON
View PDF7 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the addition of a general amine compound causes it to react with the epoxy group present in the composition over time, resulting in a decrease in storage stability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ray sensitive resin composition, curing film used for display element, forming method for curing film used for display element, and display element
  • Ray sensitive resin composition, curing film used for display element, forming method for curing film used for display element, and display element
  • Ray sensitive resin composition, curing film used for display element, forming method for curing film used for display element, and display element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0190] Hereinafter, although this invention is demonstrated in full detail based on an Example, this invention is not limited to this Example.

[0191]

Synthetic example 1

[0193] After adding 56 parts by mass of diethylene glycol methyl ethyl ether to the flask equipped with a stirrer, and replacing it with nitrogen, the temperature of the solution was raised to 80° C. while stirring slowly. 6 parts by mass of dimethyl 2,2'-azobisisobutyrate, 4 parts by mass of 2-(3,5-dimethylmethacrylate) as a compound providing the structural unit (a1) were added dropwise thereto over 3 hours. Pyrazolylcarbonylamino) ethyl ester, 8 parts by mass of methacrylic acid as a compound providing (a2) structural unit, 15 parts by mass of 2-methylglycidyl methacrylate as a compound providing (a3) ​​structural unit , 2 parts by mass of styrene and 21 parts by mass of methacrylic acid tricyclic [5.2.1.0 2，6 ]decyl-8-ester, and a mixed solution of 112 parts by mass of diethylene glycol methyl ethyl ether, further kept at this temperature for 3 hours, and polymerized, thus obtaining a solution containing a copolymer (A-1) (solid content concentration =24.4% by mass, Mw=12...

Synthetic example 2

[0195] After adding 56 parts by mass of propylene glycol monomethyl ether acetate to a flask with a stirrer, and substituting nitrogen, the temperature of the solution was raised to 80° C. while stirring slowly. 6 parts by mass of dimethyl 2,2'-azobisisobutyrate, 4 parts by mass of 2-(3,5-dimethylmethacrylate) as a compound providing the structural unit (a1) were added dropwise thereto over 3 hours. Pyrazolylcarbonylamino) ethyl ester, 7 parts by mass of acrylic acid as a compound providing (a2) structural unit, 14 parts by mass of glycidyl methacrylate as a compound providing (a3) ​​structural unit, as providing (a4) 2 parts by mass of styrene and 22 parts by mass of methacrylic acid tricyclic [5.2.1.0 2，6 ]decyl-8-ester, and a mixed solution of 112 parts by mass of propylene glycol monomethyl ether acetate, further kept at this temperature for 3 hours, and polymerized, thus obtaining a solution containing a copolymer (A-2) (solid content Concentration = 24.5% by mass, Mw = ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to view more

Abstract

The present invention relates to a ray sensitive resin composition, a curing film used for a display element, a forming method for the curing film used for the display element, and the display element. The present invention aims at providing a ray sensitive resin composition having a full resolution ratio even roasted at a low temperature, a curing film used for a display element having excellent heat resistance, reagent resistance, light-admitting quality, and solidification, and a display element having an excellent voltage holding ratio. The ray sensitive resin composition comprises: [A] a copolymer containing 0.1mole%-35mole% (a1) construction unit represented by the following formula (1); [B] a polymerizable compound having an ethylene unsaturated bond; and [C] a ray sensitive polymerization initiator.

Description

technical field [0001] The present invention relates to a radiation-sensitive composition, a cured film for a display element, a method for forming a cured film for a display element, and a display element. Background technique [0002] Radiation-sensitive resin compositions are widely used as materials for forming cured films for display elements such as interlayer insulating films, spacers, and protective films. As such a radiation-sensitive resin composition, for example, a composition containing a copolymer of an unsaturated carboxylic acid, an epoxy group-containing unsaturated compound, or the like is known (see JP-A-2001-354822). When such a composition is used to form, for example, a spacer for a display element, it is necessary to perform a firing process at a high temperature in order to increase the surface hardness of the spacer to a commercially required level. [0003] On the other hand, flexible displays such as e-paper are now popularized. Plastic substrate...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G02B1/04G02F1/1337G03F7/00
Inventor 米田英司西信弘儿玉诚一郎松本仁成
Owner JSR CORPORATIOON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap