Projection optical system

A projection optical system and positive refraction technology, which is applied in the field of high-resolution projection optical systems, can solve the problems of low resolution of the projection optical system, reduce the difficulty of processing and adjustment, and increase the processing cost, so as to improve the quality of the objective lens and reduce the adjustment and adjustment. Difficulty and precision, the effect of reducing production costs

Inactive Publication Date: 2013-09-18
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0008] In order to solve the problems of low resolution of the existing projection optical system, high processing cost, high detection accuracy, and difficult assembly and adjustment, the present invention proposes a deep ultraviolet projection optical system, which has a compact structure and a large viewing angle. Field and imaging quality are excellent, all lenses are spherical mirrors, which reduces the difficulty of processing and assembly

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Embodiment Construction

[0027] In order to better illustrate the purpose and advantages of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0028] figure 1 It is a schematic diagram of the layout of the spherical projection objective lens of the present invention, 23 pieces of spherical lenses form the first lens unit L1, the second lens unit L2, the third lens unit L3, the fourth lens unit L4 and the fifth lens unit L5, sequentially from the light beam incident Orientation settings.

[0029] The first lens unit L1 is a lens group with negative refractive power, including a first positive lens 1, a second positive lens 2, a first negative lens 3, a second negative lens 4, a first meniscus lens 5 and a second meniscus lens Lens 6. After being projected onto the first positive lens 1, the light converges through the first positive lens 1, then converges through the second positive lens 2, reaches the...

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Abstract

The invention discloses a projection optical system which is used for imaging images in an object plane into an image plane. The projection optical system sequentially comprises a first lens unit (L1), a second lens unit (L2), a third lens unit (L3), a fourth lens unit (L4) and a fifth lens unit (L5) which are arranged in the direction of the optical axis of the system; the lens units are positioned in the same optical axis; the first lens unit (L1) has negative refractive power; the second lens unit (L2) has positive refractive power; the third lens unit (L3) has negative refractive power; the fourth lens unit (L4) has positive refractive power; the fifth lens unit (L5) has positive refractive power; and all lenses adopt spherical surfaces. The projection optical system can better compensate aberration, improve the imaging quality, enhance the system resolution and improve the photolithography efficiency.

Description

technical field [0001] The invention relates to a deep ultraviolet spherical projection optical system used in a lithography process and a semiconductor element manufacturing device, and belongs to the technical field of high-resolution projection optical systems. Background technique [0002] Lithography is an integrated circuit manufacturing technology. It uses the principle of optical projection image to transfer the high-resolution graphics on the mask plate to the rubber-coated silicon wafer by exposure. Almost all integrated circuits are manufactured using optical projection lithography. Initially, semiconductor devices were manufactured using contact lithography technology in which masks were attached to silicon wafers. In 1957, contact lithography technology realized the manufacture of DRAM (Dynamic Random Access Memory) with a feature size of 20 microns. After that, the semiconductor industry introduced proximity lithography technology with a certain gap between t...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/14G02B13/22G02B3/00G02B7/02G02B27/18G03F7/20
Inventor 白瑜邢廷文吕保斌范真节邓超张海波
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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