Fully-spherical deep ultraviolet lithography objective
A lithography objective lens and deep ultraviolet technology, applied in the field of high-resolution projection lithography objective lens, can solve the problems of difficult processing and low resolution of the projection lithography objective lens, and achieve compact structure, improved imaging quality, and excellent imaging quality. Effect
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[0021] In order to better illustrate the purpose and advantages of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0022] The deep ultraviolet spherical lithography objective lens of this embodiment is composed of front and rear lens groups, and a total of 29 lenses are used. as attached figure 1 As shown, lenses 1 to 20 are the front lens group, lenses 21 to 29 are the rear lens group, and 30 is the image plane, that is, the surface where the silicon chip is located. The present invention uses fused silica (refractive index 1.560326 when the system center wavelength is 193.368nm) as the main lens material, and calcium fluoride (refractive index 1.501455 when the system center wavelength) is used as the material for correcting chromatic aberration.
[0023] The front lens group includes a first meniscus lens 1, a first negative lens 2, a first positive lens 3, a second posit...
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