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Methods and systems for bulk ultra-high purity helium supply and usage

An ultra-high-purity, helium technology, applied in container discharge methods, container filling methods, gas treatment applications, etc., can solve problems such as increasing the possibility of customer exhaustion, adverse effects of processing capacity, etc., to reduce heat leakage, The effect of efficient supply rate and efficient management

Inactive Publication Date: 2012-07-11
PRAXAIR TECH INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

These factors increase the likelihood of clients running out and therefore have a significant adverse effect on their processing capabilities

Method used

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  • Methods and systems for bulk ultra-high purity helium supply and usage
  • Methods and systems for bulk ultra-high purity helium supply and usage
  • Methods and systems for bulk ultra-high purity helium supply and usage

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Embodiment Construction

[0036] As used herein, ultra high purity (UHP) means a gas or liquid having less than about 100 parts per billion, preferably less than about 50 parts per billion, and more preferably less than about 10 parts per billion of molecular impurities , and have less than about 1000 parts per trillion, preferably less than about 500 parts per trillion, and more preferably less than about 10 parts per trillion of metal impurities. More preferably, UHP gases and liquids have less than about 10 parts per billion of molecular impurities and less than about 10 parts per billion of metallic impurities.

[0037] The present invention relates to a method for ensuring to use rates of 10Nm 3 / hr or higher to reliably supply UHP helium to customers. In one embodiment, the supply method involves direct shipment and maintenance of multiple bulk liquid helium ISO containers at the customer's site.

[0038] The present invention pertains to a robust supply system that supplies UHP helium gas at a...

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PUM

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Abstract

This invention relates to methods and systems for reliable ultra-high purity (UHP) helium gas supply and maintaining dedicated onsite inventory. Specifically, the invention employs multiple ISO containers whereby vaporized UHP helium in the standby ISO container(s) is used to build-up pressure in the online ISO container. The thermal shields of the ISO containers can be used to decrease heat leaks into the backup ISO container thereby decreasing helium vaporation rate and the amount of gas needed to be withdrawn in order to maintain the maximum allowable working pressure (MAWP) of the vessel. An even lower supply rate is possible by drawing UHP helium gas using an economizer valve but maintaining liquid in the ISO container. This makes it possible to efficiently manage the supply rate, from low flows to higher flow requirements, and to optimize UHP helium draw rate from the storage vessels. A further advantage is that UHP helium gas sent to the customer is of higher purity since it comes directly from a liquid source. The UHP helium gas can be used in semiconductor manufacturing, e.g., as a carrier gas to introduce precursors into deposition chambers during thin film deposition on the wafers.

Description

technical field [0001] The present invention relates to methods and systems for delivering ultra-high purity (UHP) helium gas to a site of use, such as a semiconductor fabrication facility. The method and system are particularly beneficial for supplying ultra-high purity helium in a wide range of flows, maintaining additional inventories of ultra-high purity helium at customer sites, and supplying ultra-high purity helium directly to the point of use. Background technique [0002] When a customer without on-site production capacity requires a large volume of gas (such as oxygen, nitrogen, argon, or hydrogen), the gas is usually transported in liquid form from the production site to a gas station near the point of use. Storage tank. However, for safety reasons, liquefied gases cannot be transported on public roads at pressures significantly higher than atmospheric pressure. For most gases, the higher pressure required at the point of use is met by increasing the pressure of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F17C7/04F17C9/02
CPCF17C2205/0332F17C2203/0626F17C2221/017F17C5/06F17C2205/0338F17C2250/0491F17C2205/013F17C2227/0302F17C2225/035F17C2265/06F17C2201/054F17C9/02F17C2201/035F17C2205/0323F17C2270/0168F17C2223/0161F17C2201/0109F17C2250/036F17C2250/0478F17C2223/033F17C2270/0518F17C2205/0341F17C2205/018F17C2203/0312F17C2250/034F17C2250/043F17C2221/05F17C2270/05F17C2223/046F17C2203/0391F17C2250/072F17C2250/0408F17C2225/043F17C2203/0316F17C2223/0115F17C2227/0393F17C2225/0123F17C2250/032
Inventor T.R.舒尔特J.J.贝尔恩M.C.约翰逊S.查克拉瓦蒂K.贝杜-阿米萨
Owner PRAXAIR TECH INC
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