Tail gas treatment device for chemical vapor deposition furnace

A chemical vapor deposition and exhaust gas treatment technology, applied in chemical instruments and methods, dispersed particle separation, dispersed particle filtration, etc., can solve the problems of abnormal wear of vacuum pump, loss of sealing function, insufficient pumping force of vacuum pump, etc., to overcome the problem of insufficient operation. , the effect of prolonging the service life and improving the control accuracy

Active Publication Date: 2012-07-25
XIAN AVIATION BRAKE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the exhaust gas produced by the chemical vapor deposition process in the prior art, which causes the loss of the sealing function of the exhaust system of the chemical vapor deposition furnace, causes insufficient vacuum pump suction and difficulty in starting, and abnormal wear of the vacuum pump, the present invention proposes a chemical vapor deposition process. Tail gas treatment device for deposition furnace

Method used

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  • Tail gas treatment device for chemical vapor deposition furnace
  • Tail gas treatment device for chemical vapor deposition furnace
  • Tail gas treatment device for chemical vapor deposition furnace

Examples

Experimental program
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Effect test

Embodiment 1

[0026] This embodiment is a tail gas treatment device for a chemical vapor deposition furnace. The chemical vapor deposition furnace is ZGC-100 type, using nitrogen and propylene as raw material gas for chemical vapor deposition, the deposition temperature is 900±50°C, the gas flow rate is 40L / min for nitrogen, 50L / min for propylene, and the furnace pressure is 3000- 5000 Pa.

[0027] This embodiment includes a tar filter 4 , a bellows 21 and a vacuum pump 24 . The inlet of the tar filter 4 communicates with the exhaust port of the furnace body 1 through the exhaust pipe 2; the outlet of the tar filter 4 communicates with the inlet end of the bellows 21 through the pipeline. There is an inlet pressure gauge 3 between the tar filter 4 and the furnace body 1 ; and an outlet pressure gauge 20 between the outlet of the tar filter 4 and the bellows 21 . The outlet end of the bellows 21 communicates with the air inlet of the vacuum pump 24 through a pipeline; a servo valve 22 and ...

Embodiment 2

[0036] This embodiment is a tail gas treatment device for a chemical vapor deposition furnace. The chemical vapor deposition furnace is ZGCJ-500-12 type, using nitrogen and propylene as raw material gas for chemical vapor deposition, the deposition temperature is 900±50°C, the gas flow rate is 80L / min for nitrogen, 60L / min for propylene, and the furnace pressure is 3000-5000Pa.

[0037] This embodiment includes a tar filter 4 , a bellows 21 and a vacuum pump 24 . The inlet of the tar filter 4 communicates with the exhaust port of the furnace body 1 through the exhaust pipe 2; the outlet of the tar filter 4 communicates with the inlet end of the bellows 21 through the pipeline. There is an inlet pressure gauge 3 between the tar filter 4 and the furnace body 1 ; and an outlet pressure gauge 20 between the outlet of the tar filter 4 and the bellows 21 . The outlet end of the bellows 21 communicates with the air inlet of the vacuum pump 24 through a pipeline; a servo valve 22 an...

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Abstract

The invention relates to a tail gas treatment device for a chemical vapor deposition furnace. An inlet of a tar filter is communicated with an exhaust port of a furnace body by an exhaust pipe. An outlet of the tar filter is communicated with an inlet end of a corrugated pipe by a pipeline. An inlet pressure gauge is arranged between the tar filter and the furnace body; and an outlet pressure gauge is arranged between the outlet of the tar filter and the corrugated pipe. An outlet end of the corrugated pipe is communicated with an air inlet of a vacuum pump by a pipeline; and a servo valve and a stop valve are sequentially installed on the pipeline between the corrugated pipe and the vacuum pump. According to the invention, a tar tank in an exhaust system of the chemical vapor deposition furnace is replaced by a pipeline with a vacuum gauge, the corrugated pipe and the tar filter, thereby effectively removing tar components in tail gas, preventing tar in the tail gas from affecting the functions of air pressure regulation, stop and sealing of a valve, overcoming the defects that the vacuum pump of the chemical vapor deposition furnace is difficult to start or worn abnormally due to the tail gas produced by the chemical vapor deposition process, and prolonging the service life of the vacuum pump.

Description

technical field [0001] The invention relates to a chemical vapor deposition furnace, in particular to a tail gas treatment device for the chemical vapor deposition furnace. Background technique [0002] Carbon-carbon composite material is a kind of composite material with specific properties, and its main preparation method is chemical vapor deposition process. The process is to place the carbon fiber prefabricated body in the working area of ​​the chemical vapor deposition furnace, heat it to 900-1100°C, and feed in hydrocarbon compounds such as methane, propylene, etc., and the hydrocarbon compounds undergo a series of cracking and polymerization reactions at high temperatures. Form a series of hydrocarbon product systems with different molecular weights and a wide range of molecular weight distribution. The molecules contain several to tens or even hundreds of carbon atoms, etc., and the parts with large molecular weights in these products are attached to the carbon fiber...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D46/12
Inventor 卢钢认崔鹏施伟伟
Owner XIAN AVIATION BRAKE TECH
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