Plasma choking method and plasma choke coil
A choke coil and plasma technology, used in circuits, inductors, electrical components, etc., can solve problems such as drop, reduce interference and increase quality factors.
Inactive Publication Date: 2012-08-01
赖秉豊 +1
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Problems solved by technology
[0007] In order to solve the problem that when the inductor in the prior art is used as a surge absorbing element, it is impossible to avoid converting the electric energy in the current into heat energy, and at the same time cause the quality factor (Quality Factor, Q value) of the inductance element to decrease. The invention provides a plasma choke method and a plasma choke coil, which can absorb the surge by ionizing the reaction fluid ["fluid" refers to gas, liquid] sealed in a closed space, and the ionized The reaction fluid moves spirally along the surface of the conductive loop, and generates a small amount of magnetic field to reduce the resistance of the required signal of the conductive loop, reduce interference, and increase the quality factor (Quality Factor, Q value)
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[0032] see Figure 1 to Figure 7 As shown, the present invention aims at providing a kind of plasma anti-flow method, and it is in the closed space 21, installs this at least one group of conductive loops 22, and fills reaction fluid 23 in this closed space 21 ["fluid" Refers to gas, liquid] [for example, pressure 0.5Torr], through the non-contact induction method or direct contact conduction method, the inductance corresponding to the external surge wave can be generated (that is, the corresponding inductance corresponding to the external surge wave can be generated) induced electromotive force), and then the conductive loop 22 in the closed space 21 and the reaction fluid 23 produce a plasma reaction [that is, the surface particles of the conductive loop 22 are dissociated into high-energy electrons, high-energy ions, and high-energy neutrals by a magnetic field or an electric field. Plasma reaction of atoms, etc.] to eliminate or absorb the external surge.
[0033] see F...
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A plasma choking method and a plasma choke coil. The plasma choking method includes steps of installing at least one conductive coil set in a closed space and filling a reaction fluid into the closed space. When a circuit is interfered with by external surge or the surge in the circuit, the surge applies an electric field or a magnetic field to the conductive coil. At this time, the conductive coil in the closed space generates an inductive reactance corresponding to the surge and carries out plasma reaction, whereby the surface particles of the conductive coil are ionized by the magnetic field or electric field into high-energy electrons, high-energy ions and high-energy neutral atoms so as to effectively eliminate or absorb the surge.
Description
technical field [0001] The invention relates to a plasma anti-current method and a plasma anti-current coil, which can introduce an external surge or a surge in a circuit into the plasma anti-current coil by using the plasma anti-current method and the plasma anti-current coil In order to effectively eliminate or absorb the surge, the surface particles of the conductive loop in the plasma choke are dissociated into high-energy electrons, high-energy ions, and high-energy neutral atoms by the magnetic field or electric field. Purpose. Background technique [0002] Various choke coils are used in various electrical products with different functions in order to increase energy efficiency and reduce power loss, thereby prolonging the life of electrical products. At present, the general choke coil is realized by an inductor (Inductor) formed by winding a coil (Coil) on the outer edge of a silicon sheet steel (Silicon sheet steel). [0003] In addition, semiconductor devices suc...
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IPC IPC(8): H01F27/34
CPCH05H1/24H01F37/00H05H1/46H05H2001/4667H05H1/4652
Inventor 赖秉豊
Owner 赖秉豊