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Cleaning solution and cleaning method

A technology for cleaning liquid and cleaning objects, applied in the field of cleaning liquid, can solve the problems of increasing power consumption and increasing wiring resistance value, and achieve the effects of inhibiting corrosion, improving productivity and improving performance

Inactive Publication Date: 2016-01-13
STELLA CHEMIFA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, the resistance value of the wiring on the integrated circuit increases to increase power consumption, so it is not preferable

Method used

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  • Cleaning solution and cleaning method
  • Cleaning solution and cleaning method
  • Cleaning solution and cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～13

[0051] As shown in Table 1, hydrogen fluoride as component (a), ammonium sulfate as component (b), and water as component (c) were mixed to prepare a cleaning solution so that the concentration of hydrogen fluoride was 0.001 to 5% by weight, sulfuric acid The concentration of ammonium is 1 to 20% by weight.

Embodiment 14～17

[0053] As shown in Table 1, hydrogen fluoride as component (a), tetramethylammonium sulfate as component (b), and water as component (c) are mixed to prepare a cleaning solution so that the concentration of hydrogen fluoride is 0.01 to 0.1 wt. %, the concentration of tetramethylammonium sulfate is 1 to 10% by weight.

Embodiment 18

[0055] As shown in Table 1, hydrogen fluoride as component (a), ammonium sulfate and ammonium chloride as component (b), and water as component (c) were mixed to prepare a cleaning solution so that the concentration of hydrogen fluoride was 0.1% by weight. , the concentration of ammonium sulfate is 5% by weight, and the concentration of ammonium chloride is 5% by weight.

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Abstract

The invention relates to a cleaning liquid and a cleaning method. An object of the present invention is to provide a cleaning solution capable of dissolving and removing cerium oxide in the form of cerium ions from an object to be cleaned having cerium oxide adhered to its surface, and a cleaning method using the cleaning solution. A cleaning liquid, characterized in that the cleaning liquid removes residual cerium oxide on the surface of the object to be cleaned, and the cleaning liquid contains (1) hydrogen fluoride and (2) ammonium salt, the ammonium salt being selected from the group consisting of ammonium chloride and ammonium nitrate , at least one of ammonium sulfate, tetramethylammonium chloride, tetramethylammonium nitrate and tetramethylammonium sulfate.

Description

technical field [0001] The present invention relates to a cleaning solution capable of cleaning and removing cerium oxide from an object to be cleaned to which cerium oxide has adhered, and a cleaning method using the cleaning solution. Background technique [0002] For the purpose of achieving high performance in large scale integration (ULSI), miniaturization of circuit design is being promoted. In order to form very fine circuit structures ranging from fine to nanometer scale, new manufacturing techniques that have not been applied until now are required in many manufacturing processes. [0003] In particular, as the most important steps for forming a fine structure on a semiconductor substrate, there are exposure and development steps using optical methods. The same uniform focusing on the surface of the semiconductor substrate for producing this fine structure is closely related to the flatness of the substrate surface. That is, when the flatness of the substrate surf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C11D7/60C11D7/32C11D7/08C11D7/10C11D10/02H01L21/02B08B3/08
CPCC11D3/04C11D3/046H01L21/306C11D2111/18C11D2111/22
Inventor 宫下雅之久次米孝信山本雅士伊达和哉
Owner STELLA CHEMIFA CORP