Manufacture method of color film base plate

A manufacturing method and technology for color filter substrates, which are applied in the photoengraving process of pattern surface, photoengraving process exposure device, optics, etc., can solve the problem of high production cost of color filter substrate, and achieve the effect of reducing production cost.

Active Publication Date: 2012-08-22
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In the prior art, in the process of forming black matrix patterns, red photoresist patterns, green photoresist patterns and blue photoresist patterns, a separate production line is required to form each patte

Method used

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  • Manufacture method of color film base plate
  • Manufacture method of color film base plate
  • Manufacture method of color film base plate

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Embodiment Construction

[0041] In order for those skilled in the art to better understand the technical solution of the present invention, the method for manufacturing the color filter substrate provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0042] Embodiment 1 of the present invention provides a method for manufacturing a color filter substrate. The method includes: forming a color photoresist pattern and a black matrix pattern on a base substrate, and synchronously forming the color photoresist pattern and the black matrix pattern.

[0043] In this embodiment, forming the color photoresist pattern and the black matrix pattern on the base substrate may specifically include: continuously forming a color photoresist layer and a black photoresist layer on the base substrate, and forming a pattern on the base substrate through a patterning process. A color photoresist pattern and a black matrix pattern on the color photoresist pattern. ...

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Abstract

The invention discloses a manufacture method of a color film base plate. The method comprises the following steps that a color light resistance pattern and a black matrix pattern are formed on a substrate base plate and are synchronously formed. According to the manufacture method of the color film base plate provided by the invention, the color light resistance pattern and the black matrix pattern are formed on the substrate base plate and are synchronously formed, so the black matrix pattern and color light resistance pattern forming process can be completed through sharing a production line, and expensive production equipment does not need to be singly configured for the black matrix pattern, so the production cost of the color film base plate is reduced.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to a method for manufacturing a color filter substrate. Background technique [0002] A liquid crystal display is a commonly used flat panel display at present, and a Thin Film Transistor Liquid Crystal Display (TFT-LCD for short) is a mainstream product in the liquid crystal display. [0003] Color filter substrate is an important part of liquid crystal display. figure 1 It is a structural schematic diagram of the color filter substrate in the prior art, such as figure 1 As shown, the typical structure of the color filter substrate includes: a base substrate 1 and a black matrix pattern 2 , a red photoresist pattern 3 , a green photoresist pattern 4 and a blue photoresist pattern 5 formed on the base substrate 1 . The manufacturing process for forming the color filter substrate includes: forming a black matrix pattern 2 on the base substrate 1 through a patterning process, and...

Claims

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Application Information

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IPC IPC(8): G02F1/1335G02B5/20G03F7/20G03F7/00
Inventor 林鸿涛
Owner BOE TECH GRP CO LTD
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