Manufacture method of color film base plate
A manufacturing method and technology for color filter substrates, which are applied in the photoengraving process of pattern surface, photoengraving process exposure device, optics, etc., can solve the problem of high production cost of color filter substrate, and achieve the effect of reducing production cost.
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[0041] In order for those skilled in the art to better understand the technical solution of the present invention, the method for manufacturing the color filter substrate provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0042] Embodiment 1 of the present invention provides a method for manufacturing a color filter substrate. The method includes: forming a color photoresist pattern and a black matrix pattern on a base substrate, and synchronously forming the color photoresist pattern and the black matrix pattern.
[0043] In this embodiment, forming the color photoresist pattern and the black matrix pattern on the base substrate may specifically include: continuously forming a color photoresist layer and a black photoresist layer on the base substrate, and forming a pattern on the base substrate through a patterning process. A color photoresist pattern and a black matrix pattern on the color photoresist pattern. ...
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