Micro-nanometer material as well as preparation method, device and application thereof
A technology of micro-nano and application devices, applied in the direction of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of micro-nano materials that have not been discovered, and achieve the effect of low cost and simple operation
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Embodiment 1
[0034] Such as figure 1 As shown, this example provides a device for preparing micro-nano materials in liquid phase, the device includes laser 1 (using Nd:YAG pulsed laser, laser wavelength 532nm, pulse width 10ns, energy 100mJ, frequency 5Hz) , a total reflection mirror 2, a focusing lens 3, a reaction target 4, a reaction vessel 5, a magnetic field application device 6, the reaction target 4 is arranged in the reaction vessel 5, there is a liquid phase substance in the reaction vessel 5, and the liquid phase substance immerses the reaction target 4, The magnetic field applying device 6 generates a magnetic field around the reaction vessel 5, and the laser light generated by the laser 1 passes through the total reflection mirror 2 and the focusing lens 3 and then focuses on the surface of the reaction target 4. During operation, the magnetic field and the laser light source act on the reaction target at the same time. The reaction container 5 adopts a quartz glass container. ...
Embodiment 2
[0045] The structure of this embodiment is the same as that of Embodiment 1 except for the following features: the reaction target used in this embodiment is a circular high-purity germanium target (99% pure), with a diameter of 25 mm and a thickness of 15 mm. The laser uses Nd:YAG pulsed laser, the laser wavelength is 532nm, the pulse width is 10ns, the energy is 50mJ, and the frequency is 1Hz. The reaction vessel is a quartz glass vessel. The liquid phase material adopts deionized aqueous solution.
[0046] During the preparation process, the magnetic field intensity was increased to 1T, so that a uniform magnetic field was formed around the reaction target; the pulsed laser power was turned on, and the pulsed laser ablation deposition reaction was performed.
Embodiment 3
[0048] The structure of this embodiment is the same as that of Embodiment 1 except for the following features: the reaction target used in this embodiment is a circular high-purity gold target (99.999% pure) with a diameter of 5 mm and a thickness of 3 mm. The laser uses Nd:YAG pulsed laser, the laser wavelength is 532nm, the pulse width is 10ns, the energy is 800mJ, and the frequency is 10Hz. The reaction vessel is a quartz glass vessel. The liquid phase material adopts deionized aqueous solution.
[0049] During the preparation process, the magnetic field intensity was increased to 9T, so that a uniform magnetic field was formed around the reaction target; the pulsed laser power was turned on, and the pulsed laser ablation deposition reaction was performed.
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