X-ray absorption grate manufacturing method and filling device thereof

An absorption grating and a manufacturing method are used in the manufacture of X-ray absorption gratings, metal-filled filling devices, and grating manufacturing equipment, which can solve the problems of high manufacturing cost, limited area, etc., and achieve convenient operation, uniform and dense filling, and device simple structure

Inactive Publication Date: 2012-09-12
SHENZHEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide an X-ray absorption grating with simple process steps, easy to realize in ordinary laboratories, and capable of producing X-ray gratings of any area in view of the defects of limited area and high manufacturing cost of the X-ray absorption grating produced in the existing LIGA technology. Absorption grating X-ray absorption grating manufacturing method

Method used

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  • X-ray absorption grate manufacturing method and filling device thereof
  • X-ray absorption grate manufacturing method and filling device thereof
  • X-ray absorption grate manufacturing method and filling device thereof

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Experimental program
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Embodiment 1

[0041] Embodiment 1. A method for manufacturing an X-ray absorption grating, comprising the following steps:

[0042] (1) Silicon-based production: select n-type or p-type silicon wafers and make a grating mask, and deposit a layer of Si on either surface of the silicon wafer 3 N 4 thin film, on Si 3 N 4 The film is coated with photoresist, and the pattern of the grating mask is photoetched onto the photoresist, and after developing and fixing, the Si at the specified position of the grating mask is sequentially removed. 3 N 4 thin film, and then remove the photoresist; then use photolithography to make a transparent electrode on the other surface of the silicon wafer to obtain a silicon base;

[0043] (2) Etch V-shaped grooves on the silicon base: protect the transparent electrode, and use an alkaline etching solution to anisotropically etch the silicon base, and do not cover Si in step (1) 3 N 4 V-shaped grooves are etched on the surface of the silicon base; the arrang...

Embodiment 2

[0075] Embodiment 2, as Figure 6 As shown, the filling device used for metal filling in the manufacture of X-ray absorption gratings includes a sealed furnace body 1 with an inner cavity, a vacuum mechanism 71 for evacuating the sealed furnace body, and an inflation mechanism for inflating the sealed furnace body 61. The inner cavity of the sealed furnace body 1 is provided with a filling pool 2 with an open top for containing and melting heavy metals, a heating mechanism 3 for heating the filling pool 2, and a lifting device for moving the silicon base 100 in the inner cavity of the sealed furnace body. Pulling mechanism 4, the lower end of the pulling mechanism 4 is provided with a supporting mechanism 5 for fixing the silicon base 100, and the sealed furnace body 1 is provided with an air extraction nozzle 72 communicating with the inner cavity of the sealed furnace body 1. The exhaust nozzle 72 is connected with a vacuum mechanism 71, and the sealed furnace body 1 is prov...

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Abstract

The invention discloses an X-ray absorption grate manufacturing method and a filling device thereof. The manufacturing method comprises the following steps of: firstly depositing and photoetching a Si3N4 film on the surface of a silicon slice, and manufacturing a transparent electrode on the other surface of the silicon slice; protecting the transparent electrode, corroding a silicon substrate to obtain a V-shaped channel; etching a groove with a high aspect ratio abrupt structure; modifying the surface of the silicon substrate and the inner wall surface of the groove; sinking the silicon substrate into molten heavy metal under vacuum for filling to obtain a X-ray absorption grate. The filling device consists of a sealing furnace body, a vacuumizing mechanism and a gas filling mechanism; and the sealing furnace body is internally provided with a filling pool, a heating mechanism, a hoisting mechanism and a supporting mechanism, an exhaust pipe opening is arranged on the sealing furnace body and connected with the vacuumizing mechanism, a gas filling pipe opening and a gas discharging pipe opening are arranged on the sealing furnace body, and the gas filling pipe opening is connected with the gas filling mechanism. According to the invention, the manufacturing method is simple for steps, easy to realize in common laboratory and capable of manufacturing grates of any area, and the filling device can perform high-quality filling on the silicon substrate.

Description

technical field [0001] The invention relates to a method for making a grating, in particular to a method for making an X-ray absorption grating. The invention also relates to grating manufacturing equipment, in particular to a filling device for metal filling in X-ray absorption grating manufacturing. Background technique [0002] The X-ray absorption grating is mainly used in the X-ray phase contrast imaging system based on the grating, and is one of the core devices of the system. The X-ray phase contrast imaging system is different from the traditional X-ray absorption imaging system commonly used at present. It is a new imaging method that uses the phase change produced by the X-ray passing through the object to image the object. In fact, substances composed of light atoms have a small absorption factor for X-rays, but a large phase factor, so it is easier to obtain high-quality images of the interior of such substances by using phase contrast than absorption contrast. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/02
Inventor 雷耀虎牛憨笨李冀郭金川
Owner SHENZHEN UNIV
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