The invention discloses an X-
ray absorption grate manufacturing method and a filling device thereof. The manufacturing method comprises the following steps of: firstly depositing and photoetching a Si3N4 film on the surface of a
silicon slice, and manufacturing a transparent
electrode on the other surface of the
silicon slice; protecting the transparent
electrode, corroding a
silicon substrate to obtain a V-shaped channel;
etching a groove with a high
aspect ratio abrupt structure; modifying the surface of the silicon substrate and the inner wall surface of the groove; sinking the silicon substrate into molten heavy
metal under vacuum for filling to obtain a X-
ray absorption grate. The filling device consists of a sealing furnace body, a vacuumizing mechanism and a gas filling mechanism; and the sealing furnace body is internally provided with a filling
pool, a heating mechanism, a hoisting mechanism and a supporting mechanism, an
exhaust pipe opening is arranged on the sealing furnace body and connected with the vacuumizing mechanism, a gas filling
pipe opening and a gas discharging
pipe opening are arranged on the sealing furnace body, and the gas filling
pipe opening is connected with the gas filling mechanism. According to the invention, the manufacturing method is simple for steps, easy to realize in common laboratory and capable of manufacturing grates of any area, and the filling device can perform high-quality filling on the silicon substrate.