Production process of polyurethane polishing pad

Abstract

The invention discloses a production process of a polyurethane polishing pad. The production process comprises the following steps of: taking a curing agent dimethylmercapto tolylenediamine, a rubber vulcanizing agent di-o-chlorodiphenylaminemethane, water, a catalyst dimethylamino ethyoxyl ethanol, polyurethane color cream and cerium oxide polishing powder as raw materials to be agitated to obtain a first component; taking polyether 2000 and isocyanate as raw materials to obtain a second component; curing the first component and the second component at a constant temperature to obtain a polyurethane elastomer; and slicing by a slicing machine to obtain the polyurethane polishing pad. With the adoption of the manner, the production process of the polyurethane polishing pad disclosed by the invention has the advantages that the polyurethane polishing pad produced by the process is not easy to deform in a precise surface polishing process and can meet requirements of high flatness and high finish degree.

Description

technical field [0001] The invention relates to the technical field of surface treatment technology, in particular to a production technology of a polyurethane polishing pad. Background technique [0002] At present, the traditional polishing pads used in the field of precision optics and touch screen glass polishing mainly include Japanese Kokonoe Electric series polyurethane polishing pads and American Global Optics series polyurethane polishing pads. Due to the immaturity of the foaming process and the limitation of the formula in the traditional polyurethane polishing pad production process, the micropore structure of the polyurethane polishing pad is unreasonable and unevenly distributed, and the foaming size of the micropores cannot be accurately controlled during the synthesis process, resulting in The local expansion coefficient is uneven, and the deformation of each part of the polyurethane polishing pad is different, which directly affects its water absorption perf...

AI Technical Summary

Problems solved by technology

Due to the immaturity of the foaming process and the limitation of the formula in the traditional polyurethane polishing pad production process, the micropore structure of the polyurethane polishing pad is unreasonable and unevenly distributed, and the foaming size of the micropores cannot be accurately controlled during the synthesis process, resulting in The local expansion coefficient is uneven, and the deformation of each part of the polyurethane polishing pad is different, which directly affects its water absorption performance and required drainage performance, resulting in uneven wear and tear of the polyurethane itself during the precision surface polishing process, and the polishing liquid used cannot be uniform and sufficient. Grinding coating, so the ideal finish and flatness cannot be achieved when polishing precision surfaces

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