Continuous preparation method for high-purity hydrogen peroxide

A hydrogen peroxide, high-purity technology, applied in chemical instruments and methods, peroxide/peroxyhydrate/peroxyacid/superoxide/ozone, inorganic chemistry, etc., can solve the problem of increasing production costs and prices of enterprises Expensive and other problems, to achieve the effect of small equipment investment, low production cost and simple process route

Active Publication Date: 2012-10-03
SUZHOU CRYSTAL CLEAR CHEMICAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation of high-purity peracetic acid without additives must use high-purity hydrogen peroxide as a raw material, but most of the existing high-purity hydrogen peroxide cannot meet this requirement, and the high-purity hydrogen peroxide that can meet this requirement is expensive. cost of production

Method used

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  • Continuous preparation method for high-purity hydrogen peroxide
  • Continuous preparation method for high-purity hydrogen peroxide
  • Continuous preparation method for high-purity hydrogen peroxide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] This embodiment provides a method for preparing high-purity hydrogen peroxide, comprising the following steps carried out sequentially and continuously:

[0029] (1), adjust hydrogen peroxide concentration to 30wt%, and control the temperature of hydrogen peroxide between 0~5 ℃;

[0030](2), make the hydrogen peroxide pass through the macroporous adsorption resin adsorption column (AB series macroporous adsorption resin of Anhui Bengbu Tianxing Resin Company), the cation exchange column (styrene series cation exchange resin 732) and the anion exchange column with the flow rate of 300L / H successively (Styrenic Weak Base Ion Exchange Resin D354), with 0.1 micron filter element circulation filtration, obtain primary purified hydrogen peroxide;

[0031] (3), make the primary purified hydrogen peroxide obtained in step (2) pass through nanofiltration membrane (Dow FILMTEC NF200-400 nanofiltration membrane) and borosilicate resin adsorption column (Shanghai Anlande Biotechnol...

Embodiment 2

[0034] This embodiment provides a method for preparing high-purity hydrogen peroxide, comprising the following steps carried out sequentially and continuously:

[0035] (1), adjust hydrogen peroxide concentration to 40wt%, and control the temperature of hydrogen peroxide between 5~10 ℃;

[0036] (2) Make the hydrogen peroxide pass through the macroporous adsorption resin adsorption column (AB series macroporous adsorption resin of Anhui Bengbu Tianxing Resin Co., Ltd.), the cation exchange column (styrene series cation exchange resin 732) and the anion exchange column successively at a flow rate of 350 L / H (Styrenic Weak Base Ion Exchange Resin D354), with 0.1 micron filter element circulation filtration, obtain primary purified hydrogen peroxide;

[0037] (3), make the primary purified hydrogen peroxide obtained in step (2) pass through nanofiltration membrane (Dow FILMTEC NF200-400 nanofiltration membrane) and borosilicate resin adsorption column (Shanghai Anlande Biotechnol...

Embodiment 3

[0040] This embodiment provides a method for preparing high-purity hydrogen peroxide, comprising the following steps carried out sequentially and continuously:

[0041] (1), adjust hydrogen peroxide concentration to 40wt%, and control the temperature of hydrogen peroxide between 0~15 ℃;

[0042] (2) Make the hydrogen peroxide pass through the macroporous adsorption resin adsorption column (YWD series macroporous adsorption resin of Cangzhou Yuanwei Chemical Co., Ltd.), the cation exchange column (Strong Acid No. 1) and the anion exchange column (styrene After being weak base ion exchange resin D370), circulate and filter with a 0.1 micron filter element to obtain primary purified hydrogen peroxide;

[0043] (3), the primary purified hydrogen peroxide obtained in step (2) passes through nanofiltration membrane (Dow FILMTEC NF200-400 nanofiltration membrane), borosilicate resin adsorption column (Rohm and Haas amberliter tm PWa10 series) successively with the flow rate of 400L / H...

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Abstract

The invention relates to a continuous preparation method for high-purity hydrogen peroxide. According to the continuous preparation method, industrial-grade hydrogen peroxide without a stabilizing agent is used a raw material. The continuous preparation method comprises the following steps which are sequentially and continuously operated: (1) adjusting the concentration of the hydrogen peroxide and controlling the temperature of the hydrogen peroxide between 0 and 15DEG C; (2) enabling the hydrogen peroxide to sequentially pass through a macroporous adsorption resin adsorption column, a cation exchange column and an anion exchange column at the flow speed of 300-450L/H and then circularly filtering the hydrogen peroxide with a filter element with 0.1 micrometer to obtain primarily-purified hydrogen peroxide; and (3) enabling the primarily-purified hydrogen peroxide to sequentially pass through a nanofiltration membrane with the aperture of 1-5 nanometers, a borosilicate resin adsorption column, a reverse osmosis membrane and mixed-bed resin at the flow speed of 300-450L/H and then circularly filtering the hydrogen peroxide with the filter element with 0.1 micrometer to obtain the high-purity hydrogen peroxide. According to the continuous preparation method disclosed by the invention, the high-purity hydrogen peroxide for preparing high-purity peracetic acid solution with no additive and favorable storage stability can be directly produced and lower production cost is obtained.

Description

technical field [0001] The invention relates to a method for preparing high-purity hydrogen peroxide, and the obtained high-purity hydrogen peroxide can be used for the preparation of high-purity peroxyacetic acid. Background technique [0002] Ultra-clean and high-purity electronic chemicals are key integrated raw materials for VLSI manufacturing, and their purity and cleanliness have a very important impact on yield, electrical performance, and reliability. The current mainstream semiconductor technology has reached 0.09-0.2 μm, and the cutting edge has reached the level of 22 nanometers. The corresponding electronic chemicals have also met the requirements of SEMIC12. The quality standards of electronic chemicals not only have strict regulations on the content of impurity ions, but also have strict regulations on the cleanliness of products and the content of dust particles. The production technology of high-purity electronic chemicals is mastered by a few developed coun...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B15/013
Inventor 王涛刘兵
Owner SUZHOU CRYSTAL CLEAR CHEMICAL CO LTD
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