Alignment mark structure of medium substrate zero layer

Abstract

An alignment mark structure of a medium substrate zero layer is a right-angle-type longitudinal through hole arranged at an edge of the medium substrate, and can be a right-angled triangle, a rectangle and a right-angled trapezoid. Materials of the medium substrate on which the alignment mark structure of the medium substrate zero layer is located comprise more than 99.6% of alumina ceramic and sapphire, and the medium substrate has a thickness of 0.1 to 0.65 mm. According to the alignment mark structure, not only can the aligning precision be ensured when photoetching of multilayer metal film is performed on the medium substrate containing micro array through holes, but also the yield of microwave film integrated circuit can be improved.

Description

Technical field [0001] The invention relates to a zero-layer alignment mark structure of a dielectric substrate, in particular to an alignment mark related to a photoetching device in the field of manufacturing microwave thin film hybrid integrated circuits or other micro-devices. Background technique [0002] In the microwave frequency band, many circuits need to be directly grounded, and the metallization of small through holes is a good grounding method. Its purpose is to reduce grounding inductance and shorten the heat transfer path, which is particularly important for microwave and millimeter wave device and circuit design. Therefore, tiny metallized vias have become a common passive component of microwave and millimeter wave integrated circuits, and the shape of the vias is usually circular. [0003] The microwave thin film hybrid integrated circuit is processed by the large substrate of the semiconductor integrated circuit and the multi-unit method, which has high productio...

AI Technical Summary

Problems solved by technology

[0007] (1) The alignment mark is a circular through hole, and it is inconvenient to align through the handwheel movement in the X and Y directions;

[0008] (2) During photolithography alignment, since the position of the alignment mark is not special, it is difficult to search for the alignment mark, which affects work efficiency;

[0009] (3) The structure of the alignment mark is the same as that of other through-hole arrays, which is easy to confuse. Once confused, it will be reworked if it is light, and the yield will be affected if it is serious;

Images