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Polycrystalline silicon ingot, preparation method of polycrystalline silicon ingot and polycrystalline silicon slice

A technology of polycrystalline silicon ingots and polycrystalline silicon wafers, which is applied in the direction of polycrystalline material growth, chemical instruments and methods, crystal growth, etc., can solve problems such as uneven crystal grains, low quality polycrystalline silicon ingots, and disordered crystal orientations, and improve photoelectric conversion efficiency , Reduce the dislocation propagation, the effect of small dislocation density

Active Publication Date: 2012-11-14
JIANGXI SAI WEI LDK SOLAR HI TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the initial nucleation is not controlled, dislocations are easily generated during the nucleation process, resulting in disordered crystal orientation and uneven grains, so the quality of polycrystalline silicon ingots prepared by this method is low
The photoelectric conversion efficiency of solar cells made from this polycrystalline silicon ingot is low

Method used

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  • Polycrystalline silicon ingot, preparation method of polycrystalline silicon ingot and polycrystalline silicon slice
  • Polycrystalline silicon ingot, preparation method of polycrystalline silicon ingot and polycrystalline silicon slice
  • Polycrystalline silicon ingot, preparation method of polycrystalline silicon ingot and polycrystalline silicon slice

Examples

Experimental program
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Effect test

Embodiment 1

[0035] A method for preparing a polycrystalline silicon ingot, comprising:

[0036] A quartz crucible is used, and a layer of silicon nitride coating is sprayed on the inner wall of the crucible. 25 pieces of square silicon nitride porous materials with a size of 155mm×155mm were paved on the bottom of the crucible. After the bedding is finished, fill the silicon material on the silicon nitride porous material until it is completely filled, Figure 1~3 It is a schematic diagram of charging in this embodiment, figure 1 Among them, 1 is a crucible, 2 is a graphite shield, 3 is a silicon nitride porous material, and 4 is a silicon material.

[0037] Put the above-mentioned crucible with silicon material into the ingot casting furnace, start the ingot casting process, evacuate, and then heat to the melting point of silicon, let the silicon material slowly melt to form a silicon melt. After the silicon material is completely melted, slowly open the heat insulation cage and lower...

Embodiment 2

[0043] A method for preparing a polycrystalline silicon ingot, comprising:

[0044] A quartz crucible is used, and a layer of silicon nitride coating is sprayed on the inner wall of the crucible. 25 square silicon carbide porous materials with a size of 155×155 mm are paved on the bottom of the crucible. After the bedding is finished, fill the silicon carbide porous material until it is completely filled.

[0045] Put the above-mentioned crucible with silicon material into the ingot casting furnace, start the ingot casting process, evacuate, and then heat to the melting point of silicon, let the silicon material slowly melt to form a silicon melt. After the silicon material is completely melted, slowly open the heat insulation cage and lower the temperature, so that the temperature of the silicon melt is lowered to form a supercooled state, and nucleation and crystallization are formed.

[0046] Wait until the silicon ingot is directional solidified. After annealing and coo...

Embodiment 3

[0051] A method for preparing a polycrystalline silicon ingot, comprising:

[0052] A quartz crucible is used, and a layer of silicon nitride coating is sprayed on the inner wall of the crucible. 25 square quartz porous materials with a size of 155×155 mm are paved on the bottom of the crucible. After laying the bedding, fill the silicon material on the porous quartz material until it is fully loaded.

[0053] Put the above-mentioned crucible with silicon material into the ingot casting furnace, start the ingot casting process, evacuate, and then heat to the melting point of silicon, let the silicon material slowly melt to form a silicon melt. After the silicon material is completely melted, slowly open the heat insulation cage and lower the temperature, so that the temperature of the silicon melt is lowered to form a supercooled state, and nucleation and crystallization are formed.

[0054] Wait until the silicon ingot is directional solidified. After annealing and cooling...

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Abstract

The invention discloses a preparation method of a polycrystalline silicon ingot. The preparation method comprises the steps that after a layer of silicon nitride is coated on the inner wall of a crucible, a layer of porous materials are paved on the bottom of the crucible, and then, silicon materials are filled on the porous materials; the crucible filled with silicon materials is heated, the silicon materials are molten to form silicon melts, then, a heat field is regulated, and the silicon melts start to form core crystallization; and when silicon melt interfaces move in a direction away from the bottom of the crucible, and the directional crystallization solidification is completed, the polycrystalline silicon ingot is obtained through annealing cooling. When the preparation method is adopted, the polycrystalline silicon ingot can obtain good initial nucleation, and the dislocation propagation of the polycrystalline silicon ingot in the growth process is reduced. The invention also simultaneously discloses the polycrystalline silicon ingot obtained by the preparation method, and a polycrystalline silicon slice prepared by using the polycrystalline silicon ingot as raw materials.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a polycrystalline silicon ingot, a preparation method thereof and a polycrystalline silicon wafer. Background technique [0002] In recent years, solar energy, as an emerging renewable green energy, has become a hotspot of development and research. With the rapid development of the solar cell industry, polysilicon, which is low in cost and suitable for large-scale production, has become one of the most important photovoltaic materials in the industry, and has gradually replaced the traditional Czochralski monocrystalline silicon in the solar cell material market. [0003] At present, the preparation method of polycrystalline silicon ingot mainly adopts the directional solidification system method (DSS for short) furnace crystal growth technology provided by GT Solar, and this method usually includes steps such as heating, melting, solidification growth, annealing and co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B11/00C30B28/06C30B29/06
Inventor 何亮胡动力张涛雷琦
Owner JIANGXI SAI WEI LDK SOLAR HI TECH CO LTD
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