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Method and apparatus for manufacturing thin film

A manufacturing method and a device manufacturing technology, which are applied in the direction of surface coating liquid devices, spray devices, lighting devices, etc., can solve problems such as residual solvent voids, and achieve the effect of avoiding dissolution

Inactive Publication Date: 2014-09-17
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0015] The present invention solves the problem of voids caused by residual solvents in the thin film formed by the spray coating method.

Method used

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  • Method and apparatus for manufacturing thin film
  • Method and apparatus for manufacturing thin film
  • Method and apparatus for manufacturing thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0287] In Example 1, two nozzles were installed, and 0.001 mass % and 0.0001 mass % of raw material liquids were sprayed, respectively. In addition, the average droplet diameter at the time of spraying was set to 5 μm.

Embodiment 2

[0288] In Example 2, two nozzles were provided, and the same raw material liquid having a concentration of 0.001% by mass was sprayed. In addition, the average droplet diameters during spraying were set to 5 μm and 3 μm, respectively.

Embodiment 3

[0289] In Example 3, three nozzles were installed, and the same raw material liquid having a concentration of 0.001% by mass was sprayed. In addition, the average droplet diameters during spraying were set to 8 μm, 5 μm, and 3 μm, respectively.

[0290] In Comparative Examples 1 to 3, 0.001% by mass of the same raw material liquid was sprayed with the same average droplet diameter corresponding to 1 to 3 nozzles, respectively.

[0291] Each produced film was evaluated for unevenness in light emission, film density, and adhesiveness to the lower layer.

[0292] The unevenness of light emission of each film was determined by irradiating the sample with a fluorescent inspection lamp Fi-51L (center wavelength: 350 nm) manufactured by TOPCON Corporation, and visually confirming the presence or absence of unevenness by photoluminescence (PL) evaluation ( ○: no unevenness, △: unevenness in a part, ×: unevenness in the whole surface).

[0293] The film density is evaluated by an X-r...

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Abstract

The present invention provides a method for producing a thin film having a high film density by a spray film forming method. A method for producing a thin film, which is characterized in that it includes the following steps in sequence: a step of spraying a raw material liquid obtained by dissolving and / or dispersing a solute in a solvent to form droplets; and a step of volatilizing and concentrating the solvent in the droplets ; The process of depositing the concentrated liquid droplets on the substrate or on the thin film provided on the substrate; wherein the liquid droplets having different droplet diameters are deposited on the substrate at the same time.

Description

technical field [0001] The present invention devises a thin film manufacturing method and a thin film manufacturing apparatus that can be used in various devices such as organic electroluminescent elements and solar cells, and various optical components such as reflectors and polarizers. Background technique [0002] In recent years, with the expansion of the network and the diversification of life styles, it is difficult to realize the added value in the existing Si semiconductor called flexibility and large area in the electronic device, and the organic electronic technology that can form a film on a thin film is receiving attention. Attention. [0003] In various organic devices such as organic electroluminescence elements and solar cells, it is important to laminate organic thin films having different functions in terms of performance improvement. As a method for producing a thin film, there are generally known dry processes such as a vacuum deposition method and wet pr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05D1/02B05B13/00H01L51/50H05B33/10
CPCH01L51/0003B05D1/34B05D1/02H01L51/56Y02E10/549H10K71/12
Inventor 冲和宏安藤广敏
Owner FUJIFILM CORP
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