Ectotrophic mycorrhiza mycelium field in situ dynamic monitoring method in ecological environment reconnaissance

An ectomycorrhizal and ecological environment technology, applied in the direction of measuring devices, instruments, optical devices, etc., can solve the problems of large damage to the host plant root system, single observation method, mycelium breakage, etc.

Active Publication Date: 2013-02-20
CHINA SHENHUA ENERGY CO LTD +2
View PDF3 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the observation method of ectomycorrhizal hyphae in the field is relatively simple, mainly by collecting the thinner root system of the host plant and bringing it back to the laboratory for film production observ

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0022] Example: Field in-situ dynamic monitoring of Pinus sylvestris rhizosphere mycorrhizal hyphae in the subsidence area of ​​Huojitu Mine in Yulin, Shaanxi

[0023] The monitoring test site is located on the bank of Gaojia, Daliuta Town, Shenmu County, Shaanxi Province, which belongs to the goaf subsidence area of ​​the Huojitu Well in the Shendong Mining Area. The host plant for the test was Pinus sylvestris 3 meters high, which was selected from the microbial reclamation demonstration base in the subsidence area of ​​live chickens and rabbits. The average plant height of Pinus sylvestris sylvestris was 1.5 meters when it was first planted. After being inoculated with the boletus strain, it grew to an average of 3 meters after 3 years of growth.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Depthaaaaaaaaaa
Depthaaaaaaaaaa
The inside diameter ofaaaaaaaaaa
Login to view more

Abstract

The invention relates to a ectotrophic mycorrhiza mycelium field in situ dynamic monitoring method in ecological environment reconnaissance. The monitoring method can completely monitor mycelium embedded on host plant root systems, and simultaneously in situ monitoring for a long time, and accordingly development rule of mycorrhiza and flora at different growing periods can be dynamically obtained. Therefore, technical support is provided for ectotrophic mycorrhiza and flora action mechanism study, quantitative study and application, and further important actual ecological significance for subsequent land restoration.

Description

technical field [0001] The invention relates to a method for in-situ dynamic collection of soil microorganisms, in particular to a method for in-situ dynamic monitoring of ectomycorrhizal hyphae in the field in ecological environment survey. Background technique [0002] Ectomycorrhizal fungi are mycorrhizal complexes formed by fungi and the roots of higher plants. They are symbiotic fungi that are ubiquitous in nature and can form symbiosis with more than 80% of terrestrial plants. The main trees with ectomycorrhiza in my country are oak, pine, willow, linden, maple, walnut and birch. A large number of research reports have proved that the fungal hyphae extend into the root cortex cells to form a hyphae network (called Hastelloy's network), and at the same time spread on the root surface to form a hyphae mantle, replacing the role of root hairs. Its main function is to expand the water and nutrient absorption area of ​​the root system; it can also secrete a variety of biol...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01B11/00G01B11/02G01B11/08G01B11/28
Inventor 毕银丽王义李少朋张建民李全生
Owner CHINA SHENHUA ENERGY CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products