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Preparation method for metamaterial and metamaterial

A technology of metamaterials and conductor layers, applied in the field of metamaterials and metamaterials preparation, to achieve the effects of large capacity, controllable electrode properties, and high process controllability

Active Publication Date: 2013-03-20
KUANG CHI INST OF ADVANCED TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, CMOS technology and bicrystalline silicon capacitors have not been applied to the preparation of metamaterials.

Method used

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  • Preparation method for metamaterial and metamaterial
  • Preparation method for metamaterial and metamaterial
  • Preparation method for metamaterial and metamaterial

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] see figure 1 , is a flow chart of a method for preparing a metamaterial provided in the first embodiment of the present invention, the method of preparation includes:

[0025] S101: forming an insulating layer on a substrate.

[0026] Specifically, an insulating layer can be deposited on the substrate; a layer of insulating layer can also be formed on the substrate, for example, a layer of two layers can be formed on a silicon substrate by dry oxidation or wet oxidation. silicon oxide.

[0027] S102: Deposit a first intrinsic polysilicon layer on the first insulating layer.

[0028] Wherein, the thickness of the deposited first intrinsic polysilicon layer is set according to specific requirements.

[0029] S103: Doping the first intrinsic polysilicon to obtain a first conductor layer.

[0030] For example, P-type or N-type impurities are implanted into the first intrinsic polysilicon layer.

[0031] S104: forming a preset microstructure array on the first conductor...

Embodiment 2

[0044] see figure 2 , is a flow chart of a method for preparing a metamaterial provided in Embodiment 2 of the present invention, and the method includes:

[0045] S201: Cleaning the substrate.

[0046] S202: forming an insulating layer on the substrate.

[0047] Specifically, an insulating layer can be deposited on the substrate; a layer of insulating layer can also be formed on the substrate, for example, a layer of two layers can be formed on a silicon substrate by dry oxidation or wet oxidation. silicon oxide.

[0048] S203: Deposit a first intrinsic polysilicon layer on the first insulating layer.

[0049] Wherein, the thickness of the deposited first intrinsic polysilicon layer is set according to specific requirements.

[0050] S204: Doping the first intrinsic polysilicon to obtain a first conductor layer.

[0051] For example, P-type or N-type impurities are implanted into the first intrinsic polysilicon layer.

[0052] S205: Coating a layer of photoresist on th...

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Abstract

The embodiment of the present invention provides a preparation method for a metamaterial. the method comprises: forming a first insulating layer on a substrate; depositing a first intrinsic poly-silicon layer on the first insulating layer; doping the first intrinsic poly-silicon layer to obtain a first conductor layer; forming a default micro-structure array on the first conductor layer; depositing a second insulating layer on the first conductor layer having a micro-structure array; depositing a second intrinsic poly-silicon layer on the second insulating layer; doping the second intrinsic poly-silicon layer to obtain a second conductor layer; and forming the default micro-structure array on the second conductor layer. The embodiment of the present invention further provides the metamaterial prepared by using the method in the above-described embodiment. The metamaterial with micro-structure of relative better controllability and double-crystal silicon capacitive characteristics can be obtained.

Description

【Technical field】 [0001] The invention relates to the technical field of composite materials, in particular to a method for preparing a supermaterial and the supermaterial. 【Background technique】 [0002] Metamaterials are a highly interdisciplinary new field that integrates electromagnetics, microwaves, terahertz, photonics, advanced engineering design, communications and other sciences. As an emerging interdisciplinary science and technology, metamaterial technology has been rated as "the world's top ten scientific and technological progress" for many times due to its outstanding physical properties. As a major development of emerging material technology, metamaterials have a large number of potential applications in aerospace, aviation, electronics, communications, Internet of Things, biomedical devices, military and other fields. The core theory of metamaterials is deformation optics that describes electromagnetic wave trajectories and metamaterial properties. A major c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/28H01L21/02H01L29/41H01L29/92
Inventor 刘若鹏赵治亚缪锡根杨宗荣
Owner KUANG CHI INST OF ADVANCED TECH
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