A dry cleaning method based on ultraviolet light

A technology of dry cleaning and ultraviolet light, which is applied in cleaning methods and appliances, chemical instruments and methods, cleaning flexible objects, etc., can solve the problems of workers endangering the environment, safety problems, pollution, etc., to avoid secondary pollution, cleaning Good net effect, high reliability effect

Active Publication Date: 2016-02-03
JIANGSU YUDI OPTICAL CO LTD
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AI Technical Summary

Problems solved by technology

The chemical cleaning in the traditional process can no longer meet the requirements. The disadvantage of the wet cleaning technology is that a large amount of pure water and toxic chemical solvents are needed in the cleaning process, which is likely to cause hazards to operators and environmental pollution. The required High-purity chemicals and deionized water are expensive, which also poses wastewater treatment and safety issues
The force between the brush and the substrate will destroy various film layers on the surface and interrupt the circuit, thus affecting the driving effect and yield of the display screen

Method used

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  • A dry cleaning method based on ultraviolet light
  • A dry cleaning method based on ultraviolet light

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Embodiment Construction

[0026] Taking the TFT-LCD glass substrate as an example, the process flow chart of this method is as follows figure 1 As shown, the specific steps are: the first step, ultrasonic cleaning, the TFT-LCD glass substrate to be cleaned is sent to the ultrasonic cleaning device through the input conveyor, the ultrasonic frequency is controlled at 28KHz-40KHz, the handling speed is 3m / min, pure The water flow rate is 30L / min, at this time, the cleaning effect is the best. The second step is high-pressure water spraying. After the ultrasonic cleaning is completed, the glass substrate is still passed through the high-pressure water spraying device at a speed of 3m / min, and the high-pressure water pump pressurizes the cleaning water (pure water) to 1.5Mpa. The third step is to dry the air knife. After the wet cleaning is completed, the glass substrate needs to be dried for the subsequent process. The high-speed gas blown from the gap is used to remove the moisture on the surface of the...

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Abstract

The invention relates to an ultraviolet-based dry type cleaning method, in particular to an ultraviolet cleaning method for cleaning organic pollutants on a surface of a TFT-LCD (thin film transistor-liquid crystal display) glass substrate. The dry type cleaning method is effectively combined with a wet type cleaning method, the surface of the TFT-LCD glass substrate is subjected to two different types of wet type cleaning methods including ultrasonic cleaning and high-pressure water sprinkling, and then is subjected to the ultraviolet-based dry type cleaning, the particles and the organic pollutants attached to the surface are removed, and then the cleanness reaches to an atomic level. The ultraviolet-based dry type cleaning method has the advantages that the cleaning effect is good, the speed is high, the green and environment-friendly effects are realized, the secondary pollution is avoided, the uniformity is high, and the like. The TFT-LCD glass substrate cleaned by the ultraviolet-based dry type cleaning method has the advantages that the finished rate is high and the quality is high, and a good foundation is laid for the subsequent process flow of the glass substrate.

Description

technical field [0001] The invention relates to the field of TFT-LCD thin film transistor liquid crystal displays (Thin Film Transistor-Liquid Crystal Display), in particular to an ultraviolet light cleaning method for cleaning organic pollutants on the surface of a TFT-LCD glass substrate. Background technique [0002] As we all know, with the rapid development of optoelectronics industry, cleaning process is an essential process in optoelectronic products, and the impact of cleaning on product quality, precision, appearance and other aspects is becoming more and more important. In the production process of liquid crystal display, the cleaning process is involved many times. The workload of cleaning process in the whole preparation process accounts for 30%-40% of the total workload. Very demanding. At present, there are mainly two types of fine cleaning technologies, one is dry cleaning technology and the other is wet cleaning technology. Wet cleaning is divided into chem...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B11/04
Inventor 任乃飞刘丹吴迪富任旭东葛小兵孙玉娟孙兵
Owner JIANGSU YUDI OPTICAL CO LTD
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