A kind of oled device
A device and anti-reflection layer technology, applied in the field of OLED devices, can solve the problems of poor light transmittance, high work function of transparent cathode structure, low work function light transmittance, etc., to improve stability, improve luminous efficiency, and improve viewing angle. Effects of Features
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Embodiment 1
[0041] This embodiment is an embodiment of the preparation of the antireflection layer material F1.
[0042] The reaction scheme is divided into two steps, the first step is the preparation of the intermediate dibromoindenofluorene, and the synthetic route is shown in the following formula:
[0043]
[0044] The specific method is:
[0045]Dissolve 26.4g of 1,4-dibromo-2,5-dimethylbenzene and 24.4g of phenylboronic acid in 300.0mL of toluene and 100.0mL of ethanol, add 27.6g of K 2 CO 3 And 0.65g of tetrabutylammonium bromide, 1.5g of tetrakis(3-phenylphosphine) palladium, refluxed for 2h, and finally obtained 22.5g of 2,5-dimethyl-4-phenylbiphenyl, with a yield of 87.2%. Continue the reaction of the obtained product in the next step, dissolve it in 200.0 mL of pyridine, add 41.2 g of potassium permanganate and 50.0 mL of water, reflux for 2 h, and the reaction is complete. After filtering, the pyridine layer was made acidic with hydrochloric acid, and a large amount of ...
Embodiment 2
[0056] This example is a preparation example of compound F2. The preparation of F2 includes two steps. The first step is the preparation of the intermediate dibromoindenofluorene, which is the same as in Example 1. The second step is the preparation of compound F2. Synthetic route As shown in the following formula:
[0057]
[0058] The specific method is:
[0059] A.25.2g (75mmol) N-p-tolyl-3-bromocarbazole was dissolved in 300ml redistilled THF, cooled the reaction system to -78°C with a cold bath, and slowly added 37.5ml of 2.4Mn -BuLi solution, after the dropwise addition is complete, keep this temperature for about 1 hour. Then 28ml of triisopropyl borate was added dropwise. After the drop, the reaction was stirred for 30 minutes, the cold bath was removed, the reaction system was slowly raised to room temperature and continued to stir at room temperature for 1.5 hours. Add 20ml of 1:1 hydrochloric acid solution dropwise to neutralize the reaction system, continue st...
Embodiment 3
[0063] This embodiment is an example of OLED device preparation. The device in this embodiment is a top-emitting organic electroluminescent device. The structure includes: a substrate 1, and a reflective layer 2, an anode 3, and a hole injection layer formed by plating on the substrate 1 in sequence. layer (HIL) 4 , hole transport layer (HTL) 5 , light emitting layer (EML) 6 , electron transport layer (ETL) 7 , electron injection layer (EIL) 8 , cathode 9 and cover layer 10 .
[0064] Wherein, the substrate 1 is a glass substrate, a quartz substrate or a flexible polymer substrate (plastic or polyimide, etc.); the reflective layer 2 can be metallic silver or silver alloy, metallic aluminum or an aluminum alloy layer, for reflecting incident substrate direction Light; the anode layer 3 can be organic semiconductor materials such as ITO (indium tin oxide), IZO (indium zinc oxide), high work function metals or alloys, and C60; all of which can achieve the purpose of the present in...
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