Exhaust pipe buffer tank of phosphorus diffusion furnace

Abstract

The invention discloses an exhaust pipe buffer tank of a phosphorus diffusion furnace. The exhaust pipe buffer tank comprises a square buffer tank body, wherein a furnace pipe opening is formed in the rear side wall of the buffer tank body; a furnace pipe of the phosphorus diffusion furnace extends into a buffer tank through the furnace pipe opening; a furnace cap is arranged on the furnace pipe mouth part; the furnace cap comprises a cylindrical quartz cap body with a sealed bottom; an outward-protruding opening extension mouth is arranged at the bottom of the cap body; a quartz clamp ring is welded on the inner wall of the bottom of the cap body; the opening extension mouth is arranged between the bottom surface of the clamp ring and the bottom wall of the cap body; the front side of the buffer tank body is open, and a sealing door is arranged; a locking structure is arranged between the left side of the sealing door and the buffer tank body; a guide structure is arranged on the sealing door; and an exhaust pipe opening is formed in the right side wall of the buffer tank body. According to the invention, a guide structure is arranged on the sealing door of the buffer tank to guide air in, and thus the tail gas discharged by the furnace pipe can be cooled and dispersed by natural air; and the furnace cap can guide phosphorus oxychloride gas to prevent the buffer tank from dispersing the harmful gas phosphorus oxychloride to air.

Description

technical field [0001] The invention relates to the field of manufacturing semiconductor discrete devices and solar cells. Background technique [0002] Phosphorus diffusion is a necessary process for manufacturing PN junctions of semiconductor discrete devices, integrated circuit chips and solar cells. At present, the technology used in this process is thermal diffusion technology. Semiconductor discrete devices are mainly used to manufacture diodes, triodes, power devices, IGBTs and thyristors, etc. This series of products has sales of tens of billions in China, and the production capacity is very large. On the other hand, as the use of solar cells, silicon wafers are also widely used. More than 70% of solar cells in the world use silicon wafers as cells. In 2011, the production capacity of 25GW has been achieved, and the polycrystalline consumption has reached 180,000 tons, which is six times the semiconductor consumption, so the output of solar energy is greater than th...

AI Technical Summary

Problems solved by technology

These ventilation devices are generally made of stainless steel or iron sheets, but phosphorus oxychloride is very corrosive, and usually these ventilation pipes will be corroded thoroughly in half a year to a year, and phosphorus oxychloride will leak out, which will cause great harm to the operator. big hazard

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