Louver type large-area cold plasma exhaust gas processing device

A waste gas treatment device, cold plasma technology, applied in the direction of separation methods, dispersed particle separation, chemical instruments and methods, etc., can solve the problems of increased breakdown voltage, increased electrode spacing, and unstable discharge, etc., to achieve the reduction of electrode Line, simple design structure, long service life

Inactive Publication Date: 2013-06-12
中维环保科技有限公司
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Especially for the coaxial discharger, it is necessary to increase the outer diameter of the outer electrode. Due to the increase of the curvature of the outer electrode and the increase of the electrode spacing, the breakdown voltage increases. Even if the double dielectric is changed to a single dielectric, the discharge may in an unstable state

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Louver type large-area cold plasma exhaust gas processing device
  • Louver type large-area cold plasma exhaust gas processing device
  • Louver type large-area cold plasma exhaust gas processing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Such as figure 1 As shown, the louver type large-area cold plasma exhaust gas treatment device of the present invention includes a plasma shell 1 . The plasma shell 1 is a cuboid box structure. Its left and right ends are respectively processed with variable-diameter air inlet 18 and air outlet 19, and its upper surface is processed with inspection hole 17. combine Figure 2 to Figure 4 As shown, 4×4 plasma generators 2 are installed in the same cross-section of the inner cavity of the plasma housing 1 . That is, four plasma generators 2 are arranged horizontally, and four plasma generators 2 are arranged vertically. The plasma generators 2 are connected to each other along the outer edge and fill up the cross section. The plasma generator 2 is perpendicular to the gas inlet 18 of the plasma housing 1 . combine Figure 5 to Figure 7 As shown, a single plasma generator 2 includes a rectangular frame base 3 . The base 3 is formed by connecting an upper plate 11, a ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a louver type large-area cold plasma exhaust gas processing device which comprises a plasma shell, a plurality of plasma generators are arranged in at least one cross section of an inner cavity of the shell, the plasma generators on a same cross section are connected along the outer edges thereof and fill the cross section, the plasma generators are perpendicular to an air inlet of the shell, each plasma generator comprises an insulating base, the front and rear surfaces of the base are respectively connected with an airflow equispaced grid, a plurality of insulating medium tubes are vertically connected between left and right plates of the inner cavity of the base from top to bottom, one ends of the insulating medium tubes are closed, the insulating medium tubes are all arranged in a same cross section of the base, the closed ends of adjacent insulating medium tubes are arranged in a left-right alternate arrangement mode, an electrode is in close fit with the inside of each insulating medium tube, one end of each electrode is connected with an electrode wire, and the electrode wires on the left and right sides of the base are respectively connected with the high voltage end and ground end of a high-voltage alternating current power supply. The louver type large-area cold plasma exhaust gas processing device disclosed by the invention can obtain a high gas processing flow rate, and can maintain high-density large-area plasmas, so that the electric discharge is in a stable state, thereby improving the treatment efficiency and reducing the energy consumption.

Description

technical field [0001] The invention relates to a waste gas purification device, in particular to a shutter-type large-area cold plasma waste gas treatment device. Background technique [0002] With the development of the economy, the toxic and harmful gaseous pollution (such as H 2 S, SO 2 , NOx, VOCs, etc.) problems are becoming increasingly serious. [0003] Low-temperature plasma technology is a hot technology in the field of gaseous pollutant control in recent years. Plasma technology has the characteristics of short treatment process, high efficiency, low energy consumption, less secondary pollution, and wide application range. It is considered to be a promising deep purification technology for environmental pollution. Plasma is a mixed state of electrons, positive and negative ions, excited atoms, atoms, and free radicals. The state of plasma mainly depends on physical and chemical parameters such as its chemical composition, particle density and particle temperat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B01D53/76
Inventor 钱黎明王祥科江健程诚张芹余红君倪国华胡浙平沈杰
Owner 中维环保科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products