The invention discloses a
louver type large-area cold
plasma exhaust gas processing device which comprises a
plasma shell, a plurality of
plasma generators are arranged in at least one cross section of an inner cavity of the shell, the plasma generators on a same cross section are connected along the outer edges thereof and fill the cross section, the plasma generators are perpendicular to an air inlet of the shell, each
plasma generator comprises an insulating base, the front and rear surfaces of the base are respectively connected with an
airflow equispaced grid, a plurality of insulating medium tubes are vertically connected between left and right plates of the inner cavity of the base from top to bottom, one ends of the insulating medium tubes are closed, the insulating medium tubes are all arranged in a same cross section of the base, the closed ends of adjacent insulating medium tubes are arranged in a left-right alternate arrangement mode, an
electrode is in close fit with the inside of each insulating medium tube, one end of each
electrode is connected with an
electrode wire, and the electrode wires on the left and right sides of the base are respectively connected with the
high voltage end and ground end of a high-
voltage alternating current power supply. The
louver type large-area cold plasma
exhaust gas processing device disclosed by the invention can obtain a high gas
processing flow rate, and can maintain high-density large-area plasmas, so that the
electric discharge is in a
stable state, thereby improving the treatment efficiency and reducing the
energy consumption.