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Ultraviolet solid-state laser with wavelength of 193 nm

A solid-state laser, 579nm technology, applied in the direction of lasers, laser parts, phonon exciters, etc., can solve the problems of high price, difficult repetition frequency, and bulky volume, and achieve high repetition frequency, compact structure, and small laser volume Effect

Inactive Publication Date: 2013-06-12
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, the ArF excimer laser is a gas discharge laser, which is bulky, expensive, and difficult to increase the repetition rate.

Method used

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  • Ultraviolet solid-state laser with wavelength of 193 nm

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Embodiment Construction

[0014] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0015] see first figure 1 , figure 1 It is a structural schematic diagram of the 193nm wavelength ultraviolet solid-state laser of the present invention. As can be seen from the figure, the 193nm wavelength ultraviolet solid-state laser of the present invention comprises a 579nm solid-state laser 1, and along the laser output direction of the 579nm solid-state laser 1 are a first lens 2, a second lens 3, a frequency doubling crystal 4, and a focusing lens 5. , and frequency crystal 6, collimator lens 7 and ultraviolet coating filter plate 8, after the laser light of the wavelength that is output by described 579nm solid-state laser 1 is 579nm through the optical system that first lens 2 and second lens 3 constitute, focus In the frequency doubling crystal 4, the frequency...

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Abstract

The invention discloses an ultraviolet solid-state laser with a wavelength of 193 nm. The ultraviolet solid-state laser comprises a solid-state laser with a wavelength of 5793 nm, a first lens, a second lens, a frequency doubling crystal, a focusing lens, a sum frequency crystal, a collimating lens and an ultraviolet coated optical filter are arranged in sequence along the laser beam direction of the solid-state laser with the wavelength of 579 nm. Compared with a traditional aerial discharge ArF excimer laser with a wavelength of 193 nm, the ultraviolet solid-state laser with the wavelength of 193 nm has the advantages of being compact in structure, low in cost, convenient to maintain and stable in performance and the like, and can provide a high-quality ultraviolet source for a photoetching system.

Description

technical field [0001] The invention relates to an ultraviolet solid laser, in particular to a 193nm wavelength ultraviolet solid laser. Background technique [0002] Short-wavelength ultraviolet laser technology, especially laser technology with a wavelength of 193nm, plays an important role in the field of lithography, and is an important technical basis for promoting the development of integrated circuit manufacturing. All 193nm lithography systems use ArF excimer lasers as light sources. However, the ArF excimer laser is a gas discharge laser, which is bulky, expensive, and difficult to increase the repetition rate. The development of ultraviolet lithography urgently needs more excellent ultraviolet solid-state light sources. Contents of the invention [0003] The object of the present invention is to overcome the above-mentioned problems existing in the existing ArF excimer laser, and provide a 193nm wavelength ultraviolet solid laser, which has the advantages of sm...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/109
Inventor 周军刘厚康何兵袁志军张海波杨依枫
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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