The invention discloses a wavelength-locked high-efficiency semiconductor laser, and belongs to the technical field of semiconductor laser devices. The laser comprises an N-type lower limiting layer, an N-type lower waveguide layer, a quantum well active layer, a P-type upper waveguide layer, an insertion layer, a P-type upper limiting layer and a P-type contact layer from an N-type substrate layer to the top in sequence, the refractive index of the insertion layer is the same as that of the P-type waveguide layer, the conduction type of the insertion layer is N-type, a current limiting layer is formed in the slow axis direction, meanwhile, a grating is formed in the resonance direction, current injection and the grating are formed by etching the insertion layer, and then the P-type upper limiting layer and the P-type contact layer are grown through a secondary epitaxial process. A high-reflection film is evaporated on the rear cavity surface of the laser, and an anti-reflection film is evaporated on the front cavity surface of the laser. The grating is integrated on a laser sheet, meanwhile, good lateral current limitation is formed, the grating and the current limiting layer adopt the same process, the preparation process is simplified, and the laser has the advantages of wavelength locking and high electro-optical efficiency.