Micro-lens array with filtering function and preparation method thereof
A microlens array and microlens technology, applied in the field of optics, can solve problems such as increasing system complexity, and achieve the effects of novel technology, improved imaging quality, and reduced system complexity and cost
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Embodiment 1
[0056] Embodiment 1 of the present invention provides a method for preparing a microlens array, see figure 1 , figure 2 , the method includes the steps of:
[0057] Step 101: Prepare different filter regions on the substrate.
[0058] Specifically, this step 101 includes the following steps:
[0059] Step 1011: Provide a base.
[0060] Preferably, a piece of glass with high light transmittance and flat surface is used as the substrate 1 .
[0061]Specifically, the substrate 1 is cleaned with water and acetone, and then placed in an oven and baked at 130° C. for 10 minutes to remove water vapor and residual acetone; after natural cooling, the color photoresist 2 is spin-coated on the Put the substrate covered with color photoresist in an oven and bake it at 85°C for 2 minutes to remove the solvent in the photoresist. Complete the preparatory work for filter preparation.
[0062] Step 1012: Expose the filter area to be preserved on the substrate.
[0063] Specifically, u...
Embodiment 2
[0085] Embodiment 2 of the present invention provides a microlens array with light filtering function, see image 3 , the microlens array includes a substrate 1 , a color photoresist 2 and a microlens 12 which are sequentially stacked and connected.
[0086] Preferably, a piece of glass with high light transmittance and flat surface is used as the substrate 1 .
[0087] Specifically, the color photoresist 2 is spin-coated on the cleaned glass substrate; under the pre-prepared mask, the filter area that needs to be preserved is exposed by ultraviolet light; the substrate 1 is developed in a special developer solution. The excess unexposed color photoresist is used to make a filter area of a certain color.
[0088] Further, the positive photoresist is spin-coated on the substrate with the filter region, and after pre-baking, the substrate with the photoresist is placed under the pre-prepared circular hole mask for ultraviolet exposure. The exposed substrate was placed in a 5...
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