Cleaning method of substrates

A substrate and cleaning agent technology, applied in the field of cleaning, can solve problems such as induced product defects, difficulty in removing small foreign matter on the substrate surface, and low product yield, and achieve the effects of increasing molecular activity, improving yield, and improving cleanliness

Active Publication Date: 2013-09-11
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is to provide a cleaning method for the substrate to overcome the defects that the cleaning method in the prior art is difficult to remove small foreign matter on the surface of the substrate, which induces defective products and causes low product yields.

Method used

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  • Cleaning method of substrates
  • Cleaning method of substrates

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Embodiment Construction

[0031] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0032] Such as figure 1 As shown, the substrate cleaning method provided in this embodiment specifically includes the following steps:

[0033] Step S101 , preheating the substrate.

[0034] Specifically, a heat source such as a hot gas source, a hot water source, or an infrared heat source is used to heat the substrate. The heating temperature of the hot water source is 80-100° C., and the heating temperature of the substrate using a hot air source or an infrared heat source can be 100-120° C.

[0035] The preheating temperature of the substrate is 25-120°C, preferably, the substrate is preheated to 40-120°C, more preferably, the substrate is preheated to 100-120°C. I...

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Abstract

The invention relates to the technical field of cleaning, in particular to a cleaning method of substrates. The cleaning method of the substrates comprises the following steps that the substrates are pre-heated, dissolution cleaning is conducted on the pre-processed substrates through cleaning agent, and secondary washing is conducted on the cleaned substrates. According to the cleaning method of the substrates, the substrates are heated, and dissolution cleaning is conducted on the substrates through the cleaning agent, so that molecular activity of organic foreign matter can be effectively increased, and solubility of the cleaning agent and the organic foreign matter are facilitated. Therefore, the fine organic foreign matter is effectively removed, cleanliness of the substrates is improved, and the qualified rate of products is promoted further.

Description

technical field [0001] The invention relates to the technical field of cleaning, in particular to a method for cleaning a substrate. Background technique [0002] With the development of science and technology, liquid crystal display technology has also been continuously improved. TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Field Effect Transistor-Liquid Crystal Display) occupies an important position in the display field due to its advantages of good image display quality, low energy consumption, and environmental protection. The display technology of OLED (Organic Light-Emitting Diode) is also increasingly mature, which has the advantages of simple structure, thin thickness, fast response speed, and rich colors. [0003] In the process of LCD and OLED, a variety of polymer materials are involved. After the substrate undergoes a series of processes such as photolithography, wet etching, and stripping, organic foreign matter often occurs. In order not to...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B3/10B08B3/02
CPCC11D11/0047H01L21/67028H01L21/67051C11D7/261C11D7/263C11D11/007H10K77/10
Inventor 张毅翁铭廷程大富郭知广尹希磊
Owner BOE TECH GRP CO LTD
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