Array substrate, manufacturing method thereof, and display device
An array substrate and substrate technology, applied in optics, instruments, electrical components, etc., can solve the problems of lower transmittance, loss of panel transmittance, increase of backlight cost, etc., to reduce the influence of transmittance and reduce light leakage The effect of the probability of occurrence
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Embodiment 1
[0057] An embodiment of the present invention provides an array substrate, which includes: a substrate, a plurality of pixels formed on the substrate, and a black matrix separating the pixels;
[0058] Corresponding to the area where the black matrix is located, the substrate is provided with a gate, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode;
[0059] The corresponding area of the pixel is provided with a first electrode and a second electrode for generating an electric field to drive the liquid crystal, the second electrode is arranged above the first electrode, and further includes:
[0060] patterned color resist layer,
[0061] The color resistance layer is disposed between the gate insulating layer and the layer where the second electrode is located, and is distributed in a corresponding area of the pixel.
[0062] In this embodiment, the gate, the gate insulating layer, the semiconductor layer, the source electrode an...
Embodiment 2
[0087] An embodiment of the present invention also provides a display device, which includes any one of the array substrates described in Embodiment 1. The display device may be any product or component with a display function such as a liquid crystal panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, and the like.
[0088] The display device described in this embodiment uses a color resist layer and a black matrix on the array substrate, so the influence of the alignment deviation between the array substrate and the color filter substrate on the transmittance can be reduced, so that the blocking area of the black matrix can be reduced. Small, the transmittance and brightness of the display device can be improved.
Embodiment 3
[0090] Such as Figure 4 with Figure 5 As shown, the embodiment of the present invention also provides a method for manufacturing an array substrate, including:
[0091] 101. Form a gate metal layer on the substrate 10, and use a patterning process to form patterns of gate lines and gates;
[0092] Optionally, in this step, a magnetron sputtering or thermal evaporation film forming method is firstly used to deposit a gate metal layer on the substrate 10 , wherein. The material for preparing the gate metal layer may be selected from one or more of molybdenum, aluminum, chromium and copper.
[0093] Optionally, the patterning process described in this embodiment refers to the entire photolithography process of forming patterns on the substrate through steps such as gluing, exposure under the mask plate, and etching, which is also called a masking process.
[0094] 102. Form patterns of the gate insulating layer 12, the semiconductor layer 13, and the source-drain electrode l...
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