Pallet and plasma processing equipment for induction heating
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
- Publication Date
- 2013-12-04
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 
Figure 2 
Figure 3
Abstract
Description
technical field
[0001] The invention relates to the technical field of microelectronic processing, in particular to a tray for induction heating and plasma processing equipment using the tray. Background technique
[0002] The principle of using metal organic chemical vapor deposition (Metal Organic Chemical Vapor Deposition, hereinafter referred to as MOCVD) equipment to prepare thin films is to mix the metal organic compound of group II or III with the hydride of group IV or V element and then pass it into the reaction chamber. The mixed gas undergoes a thermal decomposition reaction on the heated substrate surface, and epitaxially grows on the substrate surface to form a thin film.
[0003] figure 1 It is a schematic diagram of the structure of MOCVD equipment. figure 2 for along figure 1 Sectional view of line A-A in middle. Please also refer to figure 1 with figure 2 , the MOCVD equipment includes a reaction chamber 1, in the reaction chamber 1 there are vertica...