Process control method for directional solidification of polycrystalline silicon
A technology of directional solidification and process control, applied in the growth of polycrystalline materials, chemical instruments and methods, crystal growth, etc., can solve the problems of difficulty in manufacturing silicon ingots, processing silicon ingots, deformation, poor thermal conductivity, etc. Control and calculation, uniquely conceived, simple to operate effects
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0020] A device used in a polysilicon directional solidification process control method, comprising a furnace body, an upper furnace cover 1 connected with a ventilation pipeline 5 is installed on the top of the furnace body through an electric screw lifting mechanism 4 built in the furnace body, and a lower furnace cover 3 is connected by threads At the bottom of the furnace body, a crucible 19 is placed in the furnace body, and a rotatable lifting water-cooled platform mechanism 18 connected to the lower furnace cover 3 is fixedly connected with the bottom of the crucible 19. An upper heating device is installed directly above the crucible 19 in the furnace body, which includes a The upper water-cooled copper electrode 17 on the furnace wall, as well as the upper graphite electrode 16 and the upper heater graphite ring 15 installed in the furnace by means of bolts; a central heating device is installed on the outer side of the crucible 19 wall in the furnace body, which includ...
Embodiment 2
[0030] A process control method for directional solidification of polysilicon, using the device in Example 1, the preparation steps are as follows:
[0031] (1) Place a Φ900mm*600mm quartz crucible 19 in the furnace body, and connect it with the rotatable lifting water-cooling platform mechanism 18, and load 670kg of silicon material. The crucible 19 is surrounded and protected by a graphite crucible guard plate.
[0032] (2) The rotatable lifting water-cooling platform mechanism 18 drives the crucible 19 to descend, closes the upper furnace cover 1, and starts vacuuming.
[0033] (3) When the vacuum degree inside the furnace body reaches 1Pa, start to fill the furnace body with argon, and when the vacuum degree inside the furnace body reaches 60000Pa, start the upper heating device, the middle heating device and the lower heating device to start heating the silicon material 2. After 6 hours, the silicon material 2 starts to melt, and after another 4 hours of continuous heati...
Embodiment 3
[0045] A process control method for directional solidification of polysilicon, using the device in Example 1, the preparation steps are as follows:
[0046] (1) Place a Φ900mm*600mm quartz crucible 19 in the furnace body, and connect it with the rotatable lifting water-cooling platform mechanism 18, and load 640kg of silicon material. The crucible 19 is surrounded and protected by a graphite crucible guard plate.
[0047] (2) The rotatable lifting water-cooling platform mechanism 18 drives the crucible 19 to descend, closes the upper furnace cover 1, and starts vacuuming.
[0048] (3) When the vacuum degree inside the furnace body reaches 1Pa, start to fill the furnace body with argon, and when the vacuum degree inside the furnace body reaches 60000Pa, start the upper heating device, the middle heating device and the lower heating device to start heating the silicon material 2. After 6 hours, the silicon material 2 starts to melt, and after another 4 hours of continuous heati...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 