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Microcrystalline silicon thin-film solar cell and manufacturing method thereof

A microcrystalline silicon thin film, solar cell technology, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve problems such as unfavorable industrialization, reduced film density, and reduced battery performance, to optimize quality, improve quality, the effect of increasing the deposition rate

Inactive Publication Date: 2013-12-11
四川汉能光伏有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As a battery, the thickness of the microcrystalline silicon film is 1.5-4um. Such a deposition rate is inconsistent with the current requirements for high efficiency and low cost of battery manufacturing, and is not conducive to real industrialization.
[0003] However, purely and simply increasing the deposition rate of the microcrystalline silicon film will significantly reduce the density of the film, increase defects such as cracks and holes, and degrade the battery performance.
Moreover, the defects of the microcrystalline silicon film are related to the substrate on which it is deposited. The larger the texture of the substrate, the easier it is to generate defects.

Method used

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  • Microcrystalline silicon thin-film solar cell and manufacturing method thereof
  • Microcrystalline silicon thin-film solar cell and manufacturing method thereof
  • Microcrystalline silicon thin-film solar cell and manufacturing method thereof

Examples

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Embodiment 1

[0040] Example 1: A 800nm ​​SnO2:F thin film 2 is deposited on a glass substrate 1 by CVD method as the front electrode of the battery. The B-doped positive electrode layer 3, the amorphous silicon layer 4 and the P-doped negative electrode layer 5 in the amorphous silicon thin film battery structure are sequentially prepared on 2; The positive electrode layer 6, the microcrystalline layer 7, and the negative electrode layer 8 of the microcrystalline silicon battery are deposited; the microcrystalline silicon layer 7 is deposited at a high speed of 0.6nm / s in a single step. Finally, ZnO:Al / Ag / Al composite thin film 9 is deposited, and the photoelectric conversion efficiency of the microcrystalline silicon thin film battery is 9%.

Embodiment 2

[0041] Embodiment 2: A 800nm ​​SnO2:F thin film 2 is deposited on the glass substrate 1 by CVD method as the front electrode of the battery. The B-doped positive electrode layer 3, the amorphous silicon layer 4 and the P-doped negative electrode layer 5 in the amorphous silicon thin film battery structure are sequentially prepared on 2; Deposit the positive electrode layer 6, the microcrystalline layer 7, and the negative electrode layer 8 of the microcrystalline silicon cell; the microcrystalline silicon layer 7 is divided into a front gradient (grading) layer 71 and a seed (seed) layer 72 using a four-step deposition method , a microcrystalline layer 73 , and a tail grading layer 74 . The initial grading layer 71 is deposited at a low rate of 0.1-0.2nm / s to obtain a dense film layer and seed layer with a thickness of 30nm; the seed layer 72 is deposited at a low rate of 0.2-0.3nm / s to grow a 250nm high-quality The microcrystalline induction layer; the microcrystalline layer...

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Abstract

The invention discloses a microcrystalline silicon thin-film solar cell and a manufacturing method thereof. The method includes the steps that a substrate is provided, a conducting layer is deposited on the surface of the substrate, at least a cell layer comprising a microcrystalline silicon cell is deposited on the surface of the conducting layer, and a microcrystalline silicon thin-film electricity generating layer of the microcrystalline silicon cell is deposited with the step-by-step type stair deposition method. According to the microcrystalline silicon thin-film solar cell and the manufacturing method thereof, by depositing and optimizing the mass of a microcrystalline silicon thin film through multiple steps, an amorphous silicon / microcrystalline silicon laminated cell with the transferring efficiency of more than 12% is manufactured under the deposition rate of more than 7A / s.

Description

technical field [0001] The invention relates to the technical field of photovoltaic solar cells, in particular to a microcrystalline silicon thin-film solar cell and a manufacturing method thereof. Background technique [0002] Silicon-based thin-film solar cells have mature industrialization advantages, so they have good development prospects. At present, the stacked cells combined with microcrystalline silicon thin film and other silicon-based thin film cells have a stable photoelectric conversion efficiency of 11%. In these amorphous silicon / microcrystalline silicon stacked cells, amorphous silicon / amorphous silicon germanium / microcrystalline silicon stacked cells, or amorphous silicon / microcrystalline silicon / microcrystalline silicon stacked cells, cell performance mainly depends on Due to the quality of the microcrystalline silicon film, high-quality microcrystalline silicon film requires low-speed deposition to reduce film defects. Therefore, the above cells with 11%...

Claims

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Application Information

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IPC IPC(8): H01L31/0216H01L31/0224H01L31/18H01L31/20
CPCY02P70/50
Inventor 张津燕胡安红曲铭浩郁操杨少飞徐希翔
Owner 四川汉能光伏有限公司