Optical/crystal comprehensive film thickness monitoring method

Abstract

The invention discloses an optical / crystal comprehensive film thickness monitoring method for accurately controlling a film coating device to prepare a high-performance optical thin film. The method comprises the following steps: inputting film coating parameters to a computer before film coating; providing a film coating monitoring table of a coated film system according to the input film coating parameters by the computer, wherein the film coating parameters include monitoring wavelength of the corresponding layer film, the theory extreme value or crystal control coefficient; and coating the film. The optical / crystal comprehensive film thickness monitoring method provided by the invention integrates advantages of a photoelectricity extreme method and a quartz crystal oscillation method, and can overcome the defects that a tool factor of a quartz crystal oscillator is easily influenced by film layer deposition parameters when the photoelectricity extreme method and the quartz crystal oscillation method are used individually, and the error is great when a non-structured membrane system is monitored by the photoelectricity extreme method. The method can be used for monitoring a structured membrane system and the non-structured membrane system, lowers the film thickness monitoring error effectively, improves the spectrum performance of the film, and has favorable repeatability.

Description

technical field [0001] The invention relates to coating, in particular to an optical control-crystal control comprehensive film thickness monitoring method used for precise control of a coating device to prepare a high-performance optical thin film. Background technique [0002] The thickness of the film decisively affects the optical properties of the film. Achieving precise control of film thickness is a key factor in the preparation of high-performance optical films. [0003] The methods of film thickness control usually include optical monitoring method and quartz crystal oscillation method. The optical monitoring method directly monitors the optical thickness of the film layer, which uses the principle that the transmittance (or reflectance) of the film changes with the change of the film thickness to realize the monitoring of the film thickness; the more commonly used optical monitoring method is the photoelectrode Value method, the photoelectrode value method takes ...

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Problems solved by technology

This method combines the advantages of the photoelectrode value method and the quartz crystal oscillation method, and can overcome the fact that when the two are used alone, the tool factor of the quartz crystal oscillator is easily affected by the deposition parameters of the film, and the photoelectric value method has large errors in monitoring the irregular film system. The problem

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