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Co-cr-pt-b alloy sputtering target and method for producing same

A manufacturing method and a sputtering target technology, which are applied in sputtering coating, sputtering coating, disc carrier manufacturing, etc., can solve problems such as microcracks that are not recorded, and achieve prevention or suppression of nodules or The effects of particle generation, high leakage flux density, fine and uniform rolling structure

Inactive Publication Date: 2014-03-05
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no description about the relationship between the leakage flux density and B, and the problem of microcrack generation and its solution

Method used

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  • Co-cr-pt-b alloy sputtering target and method for producing same
  • Co-cr-pt-b alloy sputtering target and method for producing same
  • Co-cr-pt-b alloy sputtering target and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0098] A Co-Cr-Pt-B alloy raw material consisting of Cr: 14 atomic %, Pt: 18 atomic %, B: 10 atomic %, and the remainder consisting of Co and unavoidable impurities was subjected to high-frequency (vacuum) melting. Using a mold made of cobalt, it was cast on a copper platform at a temperature from the melting point to the melting point+100° C. to obtain an ingot of 200×300×30 mmt. Next, this ingot was heated to 800° C. to 1100° C., hot-rolled repeatedly at a reduction ratio of 15% or less, then cold-rolled at an elongation rate of 1.0%, and further machined to form a target.

[0099] It should be noted that, in the above-mentioned hot rolling, specifically, it is repeated several to tens of times at a reduction ratio of 1 to 15% per pass, and the final total reduction ratio is adjusted to about 50% to about 80%. %. The following examples and comparative examples were also hot-rolled in the same manner.

[0100] Then, the maximum magnetic permeability (μmax) and the coercive ...

Embodiment 2

[0102] A Co-Cr-Pt-B alloy raw material consisting of Cr: 14 atomic %, Pt: 18 atomic %, B: 10 atomic %, and the remainder consisting of Co and unavoidable impurities was subjected to high-frequency (vacuum) melting. Using a mold made of cobalt, it was cast on a copper platform at a temperature from the melting point to the melting point+100° C. to obtain an ingot of 200×300×30 mmt. Next, this ingot was heated to 800° C. to 1100° C., hot-rolled repeatedly at a reduction ratio of 15% or less, then cold-rolled at an elongation rate of 2.0%, and further machined to form a target.

[0103] Then, the maximum magnetic permeability (μmax) and the coercive force (Hc) of the horizontal direction with respect to the sputtering surface of this target were measured using the B-H measuring instrument (BHU-6020) manufactured by Riken Electronics. In addition, the number of microcracks was measured using FE-EPMA (model number: JXA-8500F) manufactured by JEOL Corporation. As a result, the maxi...

Embodiment 3

[0105] A Co-Cr-Pt-B alloy raw material consisting of Cr: 14 atomic %, Pt: 18 atomic %, B: 10 atomic %, and the remainder consisting of Co and unavoidable impurities was subjected to high-frequency (vacuum) melting. Using a mold made of cobalt, it was cast on a copper platform at a temperature from the melting point to the melting point+100° C. to obtain an ingot of 200×300×30 mmt. Next, the ingot is heated to 800°C to 1100°C, hot-rolled repeatedly at a reduction ratio of 15% or less, heated to 900°C, and hot-rolled at a reduction ratio of 10% in one pass immediately at 20 The target is kept in water at ℃ for 30 seconds or more, water-cooled (quick cooling), and further machined (including surface grinding) to finish it into a target.

[0106] Then, the maximum magnetic permeability (μmax) and the coercive force (Hc) of the horizontal direction with respect to the sputtering surface of this target were measured using the B-H measuring instrument (BHU-6020) manufactured by Riken...

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Abstract

Provided is Co-Cr-Pt-B alloy sputtering target characterized in that there are no more than 10 cracks of 0.1 to 20 [mu]m in a B-rich phase in a 100 [mu]m 100 [mu] area (field of view). This method for producing the Co-Cr-Pt-B alloy sputtering target is characterized in that: after a Co-Cr-Pt-B alloy cast ingot has been hot forged or hot rolled, hot rolling or hot forging is carried out to an elongation of 4% or less, and the ingot is machined and manufactured into a target having no more than 10 cracks of 0.1 to 20 [mu]m in a B-rich phase in a 100 [mu]m 100 [mu]m area (field of view); or, after hot rolling or hot forging the ingot, the ingot is rapidly cooled to -196 DEG C to 100 DEG C, machined and manufactured into a target. This target has a high leakage flux density and few microcracks in a B-rich layer, and thus stabilizes discharge and minimizes arcing.

Description

technical field [0001] The invention relates to a Co-Cr-Pt-B type alloy sputtering target suitable for manufacturing magnetic recording media and a manufacturing method thereof. Background technique [0002] In recent years, Co—Cr—Pt—B type alloys have been used as sputtering targets for forming magnetic recording media (magnetic films of hard disks, etc.). [0003] When forming a film by a sputtering method, a positive electrode and a negative electrode are usually opposed to each other, and a high voltage is applied between these substrates and the target under an inert gas atmosphere to generate an electric field. [0004] The following principle is used: through the application of the above-mentioned high voltage, the ionized electrons collide with the inert gas to form a plasma, and the positive ions in the plasma collide with the surface of the target (negative electrode) to knock out the constituent atoms of the target. The released atoms are attached to the opposing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22C19/07C22C30/00C22C30/02C22F1/10C22F1/16G11B5/851C22F1/00
CPCC22C19/07G11B5/851C23C14/3414C22F1/10C23C14/165C22F1/16C22C1/02
Inventor 森下雄斗荻野真一中村祐一郎
Owner JX NIPPON MINING & METALS CORP
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