Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sputtering target for magnetic recording medium, and process for producing same

A technology for magnetic recording medium and manufacturing method, which is applied in the direction of sputtering coating, sputtering coating, disc carrier manufacturing, etc., can solve the problems of inability to increase the leakage magnetic flux density, inability to introduce strain, etc., to prevent or Suppresses the generation of nodules and granules, improves the quality, and improves the manufacturing yield

Active Publication Date: 2014-11-26
JX NIPPON MINING & METALS CORP
View PDF14 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if cold rolling is not performed, there is a problem that strain cannot be introduced into the structure of the target, so the leakage magnetic flux density cannot be increased

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sputtering target for magnetic recording medium, and process for producing same
  • Sputtering target for magnetic recording medium, and process for producing same
  • Sputtering target for magnetic recording medium, and process for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0073] A Co-Cr-Pt-B alloy raw material containing Cr: 15 at%, Pt: 14.5 at%, B: 8 at%, the balance being Co and unavoidable impurities was subjected to high-frequency (vacuum) melting. The smelted raw material was cast on a copper flat plate using a mold made of cobalt at a temperature from the melting point to the melting point+100° C. to obtain an ingot of 180×300×33 t.

[0074] Next, this ingot was subjected to primary rolling at a total rolling reduction rate of 62%. At this time, the annealing temperature during hot rolling was set to 1090°C. Then, the obtained rolled material was subjected to secondary rolling at a total rolling reduction rate of 5.0%. Then, this is machined and finished into a target.

[0075] The surface parallel to the sputtering surface of the target was observed with an electron microscope FE-EPMA (model: JXA-8500F) manufactured by JEOL, in arbitrary 10 fields (areas) of 190 μm×240 μm. Results The average particle area of ​​the B-rich phase was 77...

Embodiment 2

[0080] As shown in Table 1, the composition ratio was adjusted to Co-15Cr-17.5Pt-8B, and the target was produced by the same production method as in Example 1. At this time, the ingot size after casting was 180×300×36t. In addition, the annealing temperature was set to 1090° C., the total rolling ratio of the primary rolling was set to 86%, and the total rolling ratio of the secondary rolling was set to 4.2%.

[0081] Analyze the target according to the same method as in Example 1, and the results are shown in Table 1. The average particle area of ​​the B-rich phase is 44.6 μm 2 , the rupture number of B-rich phase is 1500 / mm 2 . In addition, the maximum magnetic permeability with respect to the horizontal direction of the sputtering surface was 8.3.

Embodiment 3

[0083] As shown in Table 1, the composition ratio was adjusted to Co-15Cr-11Pt-12B, and the target was produced by the same production method as in Example 1. At this time, the annealing temperature was set to 1100° C., the total rolling ratio of the primary rolling was set to 73%, and the total rolling ratio of the secondary rolling was set to 3.6%.

[0084] Analyze the target according to the same method as in Example 1, and the results are shown in Table 1. The average particle area of ​​the B-rich phase is 84.9 μm 2 , the rupture number of B-rich phase is 2000 / mm 2 . In addition, the maximum magnetic permeability with respect to the horizontal direction of the sputtering surface was 11.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
areaaaaaaaaaaa
diameteraaaaaaaaaa
areaaaaaaaaaaa
Login to View More

Abstract

A sputtering target for magnetic recording media, characterized in that the B-rich phase has an average grain area of 90 µm2 or less; and a process for producing a sputtering target for magnetic recording media, the process being characterized by heat-treating an alloy ingot, subsequently subjecting the heat-treated ingot to primary rolling which includes at least one cold-rolling pass, thereafter subjecting the rolled alloy to secondary rolling, and machining the rolled alloy into a target. The sputtering target for magnetic recording media has few cracks in the B-rich phase and has a high leakage flux density. With this target, discharge during sputtering is stabilized and the arcing which occurs from cracks of the B-rich phase is inhibited. Thus, the problem of inhibiting the generation of particles is eliminated.

Description

technical field [0001] The present invention relates to a sputtering target for a magnetic recording medium used for forming a magnetic thin film of a magnetic recording medium, particularly a magnetic recording layer of a hard disk using a perpendicular magnetic recording method, and a method for manufacturing the same. Background technique [0002] In the field of magnetic recording represented by hard disk drives, materials based on Co, Fe, or Ni, which are ferromagnetic metals, are used as materials for magnetic thin films in magnetic recording media. The recording layer of the hard disk using the perpendicular magnetic recording method that has been put into practical use in recent years uses a composite material containing Co-Cr base, Co-Cr-Pt base, Co-Pt base ferromagnetic alloy and non-magnetic inorganic substances containing Co as the main component. Material. [0003] From the viewpoint of high productivity, magnetic thin films of magnetic recording media such as ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/851B21B3/00C22C19/07C22F1/10C23C14/34C22F1/00
CPCB21B3/00C23C14/34C22C19/07G11B5/851C22F1/00C23C14/3414C22F1/10Y10T29/4998
Inventor 荻野真一中村祐一郎
Owner JX NIPPON MINING & METALS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com