Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Gradual change waveguide based graphene saturable absorber and preparation method thereof

A saturable absorption, graded waveguide technology, applied in the field of saturable absorber and its preparation, can solve the problems of small interaction range between light and graphene, easy to generate thermal damage, etc., achieve easy practical application, increase the fundamental mode field area , the effect of increasing the damage threshold

Inactive Publication Date: 2014-03-19
FUDAN UNIV
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Saturable absorbers of graphene currently used in fiber lasers are graphene films inserted between two optical fibers (Q. Bao, H. Zhang, Y. Wang, Z. Ni, Y. Yan, Z. X. Shen, K. P. Loh , D. Y. Tang, Atomic-layer graphene as a saturated absorber for ultrafast pulsed lasers, Adv. Funct. Mater. 19, 1-7, (2009); Z. Sun, T. Hasan, F. Torrisi, D. Popa, G . Privitera, F. Wang, F. Bonaccorso, D. M. Basko, A. C. Ferrari, Graphene mode-locked ultrafast laser. ACS Nano 4, 803-810, (2009).), but the light in the fiber is only in the core (diameter 8μm ) medium transmission, light and graphene have a small range of action, resulting in thermal damage that is easily generated under the action of high-power light

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Gradual change waveguide based graphene saturable absorber and preparation method thereof
  • Gradual change waveguide based graphene saturable absorber and preparation method thereof
  • Gradual change waveguide based graphene saturable absorber and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The present invention will be further described below in conjunction with specific examples. The examples provide detailed implementations and specific operating procedures, but the production of the present invention is not limited to the following implementations.

[0028] The graded waveguide is mainly prepared by using multiple electrode discharge melting technology and micro-scale grinding technology to prepare the graded waveguide. figure 1 is the cross-sectional mode field diagram of the fundamental mode propagation in the single-mode fiber, figure 2 Cross-sectional mode field diagram of the fundamental mode propagation in the proposed tapered waveguide. Depend on figure 1 with figure 2 It can be seen from the comparison that the graded waveguide can greatly increase the effective area of ​​light and graphene film.

[0029] The following are the specific implementation steps:

[0030] Step 1. Using the multiple electrode discharge fusion technology of the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical fields of a micro nano device and an ultrashort pulse laser, and specifically discloses a gradual change waveguide based graphene saturable absorber and a preparation method thereof. Conventionally, the quite small effect area of a base mode and a graphene film in a fiber waveguide causes light concentration type heat damage. In the graphene saturable absorber, a left-end fiber with a gradual change waveguide, a graphene film and a right-end fiber with a gradual change waveguide form a sandwich structure. The graphene saturable absorber prepared by use of the gradual change waveguides enables larger effect area of a light spreading base mold and graphene in a light waveguide, reduces concentration heat damage, and can be used in different wavelengths. The preparation process is simple, the cost is low, the actual application is facilitated, and the fiber system integration is facilitated.

Description

technical field [0001] The invention belongs to the technical field of micro-nano devices and ultrashort pulse laser technology, and in particular relates to a saturable absorber and a preparation method thereof. Background technique [0002] Ultrafast and ultrashort pulse technology plays a very important role in manufacturing, aerospace, biology, military and many other fields. Saturable absorbers have an extremely important impact on the development of ultrafast and ultrashort pulse technology. Although there are semiconductors that can Saturable absorbers, carbon nanotubes, etc. are used as saturable absorbers to generate ultrafast and ultrashort pulses, but there are deficiencies, such as: the preparation process of semiconductor saturable absorbers is complicated and the cost is high, and the surface of carbon nanotubes The scattering is serious, and it is easy to gather into beams, and it is difficult to disperse, which seriously affects its optical performance. [0...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/098
Inventor 何晓颖徐敏
Owner FUDAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com