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Nanometre imprinting device and imprinting method thereof

A technology of nanoimprinting and embossing plates, which is applied in the fields of optics, optomechanical equipment, instruments, etc., can solve the problems of restricting the promotion of nanoimprinting technology and the difficulty of nanoimprinting plates, and achieve the effect of shortening the production cycle and reducing requirements

Inactive Publication Date: 2014-04-02
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the preparation of this nanoimprint plate is a difficult problem, such as relying on the above-mentioned low-speed and high-cost electron beam lithography and other technologies, thus limiting the further promotion of nanoimprint technology
Although the roller-type imprinting technology can continuously print nano-pattern arrays to a certain extent, it is limited by the size of each roller and the shape of the embossing plate. It is hoped to obtain a flexible nano-pattern array and improve production efficiency. not ideal

Method used

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  • Nanometre imprinting device and imprinting method thereof
  • Nanometre imprinting device and imprinting method thereof
  • Nanometre imprinting device and imprinting method thereof

Examples

Experimental program
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Embodiment 2

[0062] The structures and operation modes of other components of the nanoimprinting device in this embodiment can be referred to in Embodiment 1.

[0063] Compared with Example 1, the imprinting method of the nanoimprinting device in this embodiment is different in that: in step 2, the embossing plate 30 is in contact with the substrate 20 and pressurized, and the nanopattern unit 30a is transferred to the substrate 20 After printing, the nano-pattern unit 21 on the substrate 20 needs to be cured by light through an ultraviolet curing system, and then the printing plate 30 and the substrate 20 are separated to complete an imprinting cycle operation. Refer to Example 1 for other implementation steps.

[0064] Example 3

Embodiment 3

[0066] The structures and operation modes of other components of the nanoimprinting device in this embodiment can be referred to in Embodiment 1.

[0067] Compared with Example 1, the imprinting method of the nanoimprinting device in this embodiment is different in that in step 2, it is necessary to start the thermal curing system to heat the imprinting jig 42, and transfer the heat to the imprinting jig 42 through the imprinting jig 42. Edition 30. When the embossing plate 30 is in contact with the substrate 20 and pressurized to transfer the nano-pattern unit 30a to the substrate 20, the embossing plate 30 heat-cures the nano-pattern unit 21 on the substrate 20, and then separates the embossing plate 30 and the substrate 20 to complete an embossing cycle operation. Refer to Example 1 for other implementation steps.

[0068] Example 4

Embodiment 4

[0070] For the imprinting method of the nanoimprinting device in this embodiment, reference may be made to that shown in Embodiment 1.

[0071] Example 5

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Abstract

The invention relates to the technical field of nanometre printing, and particularly provides an imprinting method of a nanometre imprinting device. The imprinting method comprises the following steps: a substrate and at least one imprinting plate pre-provided with nanometre graph units are provided; the imprinting plate is aligned with the substrate, so that the substrate is pressed by the imprinting plate, and the nanometre graph units are transferred to the substrate to form nanometre pattern units, then the imprinting plate and the substrate are separated to finish an imprinting period; the imprinting period is repeated for many times, so that a nanometre pattern array formed by the plurality of nanometre pattern units is obtained on the substrate. The invention further provides a structure of the nanometre imprinting device. According to the imprinting method provided by the invention, the nanometre pattern units are periodically and repeatedly transferred to the substrate by the imprinting plate only provided with the nanometre graph units to form the nanometre pattern array. The imprinting method is flexible and varied, convenient and controllable, and capable of greatly reducing the manufacturing cost and time of the nanometre pattern array.

Description

technical field [0001] The invention relates to the technical field of imprinting, in particular to a nanoimprinting device and an imprinting method thereof. Background technique [0002] The development of integrated circuits has promoted the prosperity of the information society and brought us various consumer electronics products that are smaller, faster, and lower in power consumption. Since the 1960s, the number of transistors on a single integrated circuit system has steadily increased according to Moore's Law. However, the continuous reduction of device size increases the difficulty of processing technology. Traditional optical lithography technology is limited by the diffraction limit. After the pattern size reaches the submicron scale, the cost of lithography increases sharply, and the resolution of lithography reaches the limit at the scale of 10nm; although electron beam / particle beam lithography has high resolution and does not require Mask, but the equipment i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 陈沁
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI