Process for removing and recycling dimethyldichlorosilane from hydrochloric acid gas
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 余家骧
- Publication Date
- 2014-04-16
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Abstract
Description
technical field
[0001] The invention relates to the field of chemistry, and relates to a process for removing and recovering dimethyldichlorosilane from hydrochloric acid gas. Background technique
[0002] Existing large-scale organosilicon equipment hydrolyzes dimethyldichlorosilane chloride to generate siloxane by-product hydrochloric acid gas, which is also called HCl gas. Then HCl gas and methanol in saturated ZnCl 2 Chloromethane is generated under the catalysis of the solution, which is also called CH 3 Cl. CH 3 Cl reacts with Si powder in a fluidized bed to form chlorosilanes. Its main chemical reaction equation is:
[0003] n(CH 3 ) 2 SiCl 2 +nH 2 O—→〔CH 3 ) 2 SiO〕 n +2n HCl↑ (1)
[0004] Dimethyldichlorosilane Siloxane
[0005] 2HCl+CH 3 OH—→CH 3 Cl 3 +H 2 O (2)
[0006] Chloromethane
[0007] 2CH 3 Cl+Si—→(CH 3 ) 2 SiCl 2 (3)
[0008] Dimethyldichlorosilane
[0009] The most economical dimethyldichlorosilane hydrolysis method today is t...