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A base station and control method that can be used for fine control of power field spatial distribution

A technology of spatial distribution and fine control, which is applied in the direction of electric controllers and controllers with specific characteristics, etc., can solve the problem of inability to realize flexible regulation of spatial distribution of process factors, poor adjustment and correction ability, and inability to realize fine regulation of spatial distribution of process quality and other issues, to achieve the effect of enhanced stability and compatibility, good adaptability, and good correction ability

Inactive Publication Date: 2016-08-17
TSINGHUA UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This actually requires the equipment to have more precise control over the spatial distribution of process factors. However, the existing CVD chamber design is generally too rigid, and can only adjust the average value of process factors, and cannot flexibly control the spatial distribution of process factors. , the process quality is guaranteed by simple structure and rough process condition control, which leads to relatively poor adaptability of equipment to different process requirements and adjustment and correction capabilities of process deviations. At the same time, it is impossible to achieve fine spatial distribution of process quality. regulation

Method used

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  • A base station and control method that can be used for fine control of power field spatial distribution
  • A base station and control method that can be used for fine control of power field spatial distribution
  • A base station and control method that can be used for fine control of power field spatial distribution

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Embodiment 1

[0029] figure 2 and Figure 4 It is a schematic diagram of the first embodiment of the base station 8 of the present invention, which realizes the flexible control capability and refined control of power spatial distribution.

[0030] The submount metal base 81 is divided into several regions insulated from each other by an insulating layer 82 . There are two or more insulating layers 82, which divide the abutment into annular areas with different diameters, and the number and distribution thereof are designed according to the control precision requirements. Through the insulating layer, the conductive effect between adjacent regions is reduced, making the control between different regions more independent.

[0031] A set of adjustable resistors and capacitors 83 and an impedance detection unit 84 are arranged inside the metal base body 81 and in each insulating region between the insulating layers 82 . The adjustable resistor and capacitor 83 are used to adjust the spatia...

Embodiment 2

[0041] image 3 and Figure 4 It is a schematic diagram of the second embodiment of the abutment 8 of the present invention. Compared with the first embodiment, in addition to the ring-shaped insulating layer, four linear insulating layers are also arranged along the diameter direction to insulate the heat. The belt is divided into several fan-shaped areas. The insulating layer is set according to the control accuracy requirements, making the control more precise.

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Abstract

The invention relates to a base platform for fine control of space distribution of a power field and a control method thereof, and belongs to the technical field of chemical vapor deposition. A plurality of insulation layers are arranged on a metal base of the base platform and divide the metal base of the base platform into annular or sector areas with different diameters. A plurality of adjustable resistance capacitors and impedance detecting units are arranged in the annular or sector areas divided by the insulation layers in the metal base of the base station respectively. The adjustable resistance capacitors are used for adjusting the space distribution of the power field, and the impedance detecting units are used for detecting the space distribution of the power in the areas. A control module can precisely control power space distribution to enable the distribution to be close to the expected requirement for the power space distribution. The conductivity of the adjacent areas is reduced through the insulation layers, and control over different areas can be more independent. Thus, independent and controllable power adjusting devices are arranged in different areas, and the capacity of flexible and fine adjusting of the space distribution of the power field is achieved.

Description

technical field [0001] The invention relates to a base platform and a control method that can be used for finely controlling the spatial distribution of a power field, and belongs to the technical field of chemical vapor deposition. Background technique [0002] Power spatial distribution control has important applications in many fields. The current power spatial distribution control is mostly aimed at adjusting the average electromagnetic field in space, but in many occasions, it is necessary to fine-tune the power field spatial distribution. Plasma-enhanced chemical vapor deposition (PECVD) equipment puts forward requirements for the fine control of the spatial distribution of the power field. Taking a multi-degree-of-freedom controllable ion-enhanced chemical vapor deposition (PECVD) equipment as an example, the existing chemical vapor deposition equipment is briefly described. [0003] figure 1 It is a schematic structural diagram of a PECVD device in the prior art, i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B11/42
Inventor 向东杨旺夏焕雄张瀚王伟牟鹏刘学平
Owner TSINGHUA UNIV
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