In-situ morphology and optical performance monitoring evaporation source and vacuum deposition equipment

Abstract

The invention relates to an in-situ morphology and optical performance monitoring evaporation source. The in-situ morphology and optical performance monitoring evaporation source comprises a vacuum flange, a heat shielding assembly supported on any one side face of the vacuum flange, a heating assembly which is embedded at one end, which is far away from the vacuum flange, of the heat shielding assembly, a material container which is arranged in the heating assembly, a temperature measuring assembly which is mounted adjacently to the material container and is used for measuring the temperature, a vacuum electric connector which is respectively electrically connected with the heating assembly and the temperature measuring assembly and is mounted on the vacuum flange, and a control power source which is connected with the vacuum electric connector; the evaporation source further comprises a microscope mounted in the heat shielding assembly; and the vacuum flange is provided with an observation window which is opposite to the position of the microscope. The heat shielding assembly is internally provided with the microscope and the vacuum flange is provided with the observation window which is opposite to the position of the microscope, so that the morphology and the optical performance of a deposited material on the surface of a substrate can be monitored in real time when the evaporation material is deposited.

Description

technical field [0001] The invention relates to an evaporation source for in-situ morphology and optical performance monitoring, and also relates to a vacuum deposition device for in-situ morphology and optical performance monitoring. Background technique [0002] Thin film materials have a wide range of applications in various fields, such as anti-corrosion, anti-reflection, optical lenses, microelectronic devices and optoelectronics, etc. For now, people have developed a variety of methods to prepare thin film materials, such as vacuum thermal evaporation deposition, vacuum sputtering, spin coating, pulling, spraying and so on. For most optical and electronic devices, the requirements for the fabricated thin films are extremely high, such as uniformity, thickness control, impurity concentration, etc. Among the developed technologies, vacuum deposition technology is a conventional thin film fabrication method. Its advantages lie in the high quality of the film produced, ...

AI Technical Summary

Problems solved by technology

[0005] Electron diffraction technique is a commonly used technique for observing crystal growth process in situ. It is based on the diffraction of electrons of a single energy on the crystal surface to deduce the crystal surface structure, and is widely used in molecular beam epitaxy and organic molecules in single crystals. Surface self-organization; the disadvantage is that the substrate used must be conductive, or electrons cannot reach the sample surface due to charging

In addition, the high-energy electrons used may cause damage to materials, especially organic materials, resulting in material performance degradation or even failure

This technique can only obtain surface structure information, and other important information such as morphology and optical properties cannot be obtained; more importantly, this technique can only be applied to crystal materials

The further development of electron diffraction microscopy partially solves the shortcomings of electron diffraction technology, which can observe the morphology and obtain the contrast of different amorphous materials; however, the required conductive substrate and the destructiveness to the material still limit its further development. Generalize to all materials

Therefore, the existing vacuum deposition equipment still lacks components for direct observation of the surface of the deposited material, and cannot monitor the in-situ morphology and optical properties during crystal growth.

Images