Method for processing micro-electromechanical systems (MEMS) sensor
A processing method and sensor technology, which are applied in the process of producing decorative surface effects, metal material coating process, decorative arts, etc., can solve the problems of high control difficulty, high cost, complex process, etc. The effect of low production cost and simple process
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[0033] The invention is mainly used for the processing of micro sensors such as MEMS microphones, and mainly involves key processes such as low-stress thin film technology, deep groove etching technology, special photoresist protection technology after deep groove etching, structure release and drying. The invention does not require thinning of silicon wafers, and ensures smooth tape-out and achieves good yield through special film stress control technology.
[0034] The present invention will be further described below with reference to specific embodiments and accompanying drawings. More details are set forth in the following description to facilitate a full understanding of the present invention, but it is obvious that the present invention can be implemented in many other ways that are different from those described herein. Those skilled in the art can make similar promotion and deduction according to the actual application situation without violating the connotation of the...
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