Schottky clamping diode with groove structure and terminal structure
A terminal structure and diode technology, applied in the field of electronics, can solve problems such as concentration, large voltage drop of oxide layer structure, weak withstand voltage, etc.
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[0020] see image 3 As shown, in the following embodiments, taking N-type epitaxy as an example, the improved Schottky clamp diode with trench structure includes:
[0021] An N-type epitaxial layer 1 is used as the cathode 2 of the Schottky embedded diode with trench structure. The resistivity and thickness of the N-type epitaxial layer 1 are determined according to the reverse withstand voltage of the product itself.
[0022] A plurality of trenches 3 formed by an etching process in the N-type epitaxial layer 1 first grow a layer of first oxide layer 8 inside the trenches 3, and then fill them by thermal oxidation or CVD (chemical vapor deposition) Into the polysilicon 7, and finally form the trench region.
[0023] A P-type doped region (P well) 4 formed by ion implantation at the bottom of the trench 3, the P-type doped region 4 wraps the bottom of the trench 3, and each P-type doped region 4 is mutually will not be connected.
[0024] The metal layer 5 formed on the up...
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