Reticle transfer device and method

Abstract

The invention provides a mask transmission device which comprises a first mask library, a second mask library, a pre-aligning mechanism, a first transmission mechanism and a second transmission mechanism. A mask is transmitted among the first mask library, the second mask library and the pre-aligning mechanism through the first transmission mechanism and transmitted among a mask table, the pre-aligning mechanism and the second mask library through the second transmission mechanism, and the first transmission mechanism and the second transmission mechanism comprise mechanical arms, single-shaft moving systems and air cylinders. The single-shaft moving systems and the air cylinders respectively drive the mechanical arms to move in two perpendicular directions. The mechanical arms upward moves in two perpendicular directions through superposed usage of the single-shaft moving systems and the air cylinders, the multivariant mechanical arms are replaced by multiple single-freedom-degree systems, and the mask transmission device and method is simple and efficient in operation and control.

Description

technical field [0001] The present invention relates to the technical field of semiconductor process equipment, in particular to a reticle transfer device and method. Background technique [0002] At present, with the higher and higher requirements for the productivity of the semiconductor industry, the requirements for the reliability of the lithography machine are also continuously improved. As we all know, the reliability of the lithography machine mainly depends on the silicon wafer transmission and mask transmission subsystem. Please refer to figure 1 , which is a structural schematic diagram of a photolithography machine. The mask transfer system 10 transfers the reticle to the mask table 1, and the light emitted by the illumination system projects the reticle through the projection objective lens 2 and forms an image on the silicon wafer adsorbed by the moving table 3. . [0003] Due to the high cost and high precision of the mask plate, mask transfer has high reli...

AI Technical Summary

Problems solved by technology

[0004] 1. The multi-degree-of-freedom manipulator is easy to collide with the surroundings, resulting in damage to the mask or damage to the manipulator;

[0005] 2. Multi-degree-of-freedom manipulator structure, complex control system and high cost;

[0006] 3. The protection mechanism of the multi-degree-of-freedom manipulator mainly considers safety from the software, which greatly reduces the real safety

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