Extreme ultraviolet lithography light source collection and illumination system
A technology for extreme ultraviolet lithography and lighting systems, applied in the field of extreme ultraviolet lithography light source collection and lighting systems, can solve the problems of short axial distance, difficult processing of hyperbolic reflective surfaces, and no practical approval, and achieve easy Processing and assembly, the effect of reducing manufacturing costs
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[0027] combine figure 1 and figure 2 , an embodiment of the present invention is given, which is mainly used as a further detailed description of the present invention, but is not used to limit the scope of the present invention.
[0028] like figure 1 As shown, the EUV lithography light source collection and illumination system provided in this embodiment includes a light source 1 , a front mirror group 2 , a rear mirror group 3 , and an illumination spot 4 . The illumination aperture angle of the mask should be matched with the object aperture angle of the projection system. According to this condition, it can be preliminarily determined that the image-side numerical aperture of the light source collection and illumination system in this embodiment is 0.3 (approximately the rear surface of the system). The half-angle radian value of the illumination spot 4). If a laser plasma light source (LPP) is used as the light source, since the size of its plasma is small (500um), i...
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