Methods for preparing compact silicon nitride ceramic material and compact special-shaped silicon nitride ceramic material by virtue of aqueous tape casting
A technology for water-based tape casting and silicon nitride ceramics, which is applied in the field of preparing silicon nitride ceramic materials, can solve the problems of low density, small size of sintered blocks, difficult processing, etc. Superior performance, high strength, and reduced processing difficulties
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specific Embodiment approach 1
[0052] Embodiment 1: This embodiment is a method for preparing dense silicon nitride ceramic materials by water-based tape casting, which is completed according to the following steps:
[0053] 1. Adding sintering aids: First, use absolute ethanol to mix silicon nitride powder and sintering aids powder, stir for 20h-24h at a stirring speed of 300r / min-350r / min, and then stir at a temperature of 50 Dry at ℃~80℃ for 10~12 hours, then mechanically pulverize and sieve to obtain silicon nitride / sintering aid powder;
[0054] The silicon nitride powder described in step 1 accounts for 90% to 95% of the total mass of the silicon nitride powder and the sintering aid powder;
[0055] The sintering aid powder described in step 1 accounts for 5% to 10% of the total mass of the silicon nitride powder and the sintering aid powder;
[0056] The volume ratio of the total mass of the silicon nitride powder and sintering aid powder described in step 1 to absolute ethanol is 1g:(10mL-15mL);
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specific Embodiment approach 2
[0074] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the mass ratio of the polyvinyl alcohol solution described in step 2 to the silicon nitride / sintering aid powder is (0.06-0.08):1. Other steps are the same as in the first embodiment.
specific Embodiment approach 3
[0075] Embodiment 3: The difference between this embodiment and Embodiment 1 or 2 is that in step 3, the slurry is poured on the glass substrate for tape casting, and the speed of the scraper during the tape casting process is 15cm / min~20cm / min, drying the flow-cast slurry at room temperature for 16h-20h, peeling off the glass substrate to obtain a silicon nitride ceramic green tape with a thickness of 200μm-300μm. Other steps are the same as those in Embodiment 1 or 2.
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