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Fe-Pt-based sputtering target in which C particles are dispersed

A sputtering target and particle technology, which is applied in the field of sputtering targets, can solve problems such as shedding, and achieve the effect of reducing the amount of powder particles

Active Publication Date: 2014-07-16
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, C falls off from the alloy phase of the target during sputtering, which also causes particles to be generated.

Method used

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  • Fe-Pt-based sputtering target in which C particles are dispersed
  • Fe-Pt-based sputtering target in which C particles are dispersed

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0059] Fe powder with an average particle size of 3 μm, Pt powder with an average particle size of 3 μm, C powder with an average particle size of 1 μm, and TiO with an average particle size of 1 μm were prepared as raw material powders. 2 powder. As C powder, commercially available amorphous carbon was used.

[0060] to become 41Fe-40Pt-9TiO 2 These powders were weighed so that the total weight may be 2600 g at -10C (mol %).

[0061] Next, the weighed powder was enclosed in a 10-liter ball mill tank together with titanium dioxide balls as a grinding medium, and rotated for 4 hours to perform mixing and grinding. Then, the mixed powder taken out from the ball mill was filled into a carbon mold and hot-pressed.

[0062] The hot pressing conditions were set to vacuum atmosphere, heating rate 300° C. / hour, holding temperature 1200° C., holding time 2 hours, and pressurized at 30 MPa from the start of heating to the end of holding. After the hold is over, let it cool naturally...

Embodiment 2

[0069] Fe powder with an average particle size of 3 μm, Pt powder with an average particle size of 3 μm, C powder with an average particle size of 1 μm, and TiO with an average particle size of 1 μm were prepared as raw material powders. 2 powder. As C powder, commercially available amorphous carbon was used. to become 29Fe-60Pt-1TiO 2 These powders were weighed so that the total weight may be 2600 g at -10C (mol %).

[0070] Next, the weighed powder was enclosed in a 10-liter ball mill tank together with titanium dioxide balls as a grinding medium, and rotated for 4 hours to perform mixing and grinding. Then, the mixed powder taken out from the ball mill was filled into a carbon mold and hot-pressed.

[0071] The hot pressing conditions were set to vacuum atmosphere, heating rate 300° C. / hour, holding temperature 1200° C., holding time 2 hours, and pressurized at 30 MPa from the start of heating to the end of holding. After the hold is over, let it cool naturally in the c...

Embodiment 3

[0078] Fe powder with an average particle size of 3 μm, Pt powder with an average particle size of 3 μm, C powder with an average particle size of 1 μm, and TiO with an average particle size of 1 μm were prepared as raw material powders. 2 powder. As C powder, commercially available amorphous carbon was used.

[0079] to become 69Fe-10Pt-20TiO 2 These powders were weighed so that the total weight was 2600 g at -1C (mol %).

[0080]Next, the weighed powder was enclosed in a 10-liter ball mill tank together with titanium dioxide balls as a grinding medium, and rotated for 4 hours to perform mixing and grinding. Then, the mixed powder taken out from the ball mill was filled into a carbon mold and hot-pressed.

[0081] The hot pressing conditions were set to vacuum atmosphere, heating rate 300° C. / hour, holding temperature 1100° C., holding time 2 hours, and pressurized at 30 MPa from the start of heating to the end of holding. After the hold is over, let it cool naturally in ...

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Abstract

A sputtering target for magnetic recording films, which is characterized by containing from 5 mol% to 60 mol% (inclusive) of Pt, from 0.1 mol% to 40 mol% (inclusive) of C and from 0.05 mol% to 20 mol% (inclusive) of titanium oxide, with the balance made up of Fe. The present invention addresses the problem of providing a high-density sputtering target which enables the formation of a magnetic thin film having a granular structure without using an expensive co-sputtering system, while reducing the amount of particles generated during the sputtering.

Description

technical field [0001] The present invention relates to a sputtering target used for forming a granular magnetic thin film of a magnetic recording medium, and relates to a Fe—Pt type sputtering target in which C particles are dispersed. Background technique [0002] In the field of magnetic recording represented by hard disk drives, materials based on ferromagnetic metals Co, Fe, or Ni are used as materials for magnetic thin films in magnetic recording media. For example, Co—Cr type and Co—Cr—Pt type ferromagnetic alloys containing Co as a main component have been used as magnetic thin films of hard disks employing an in-plane magnetic recording method. [0003] In addition, the magnetic thin film of the hard disk adopting the perpendicular magnetic recording system that has been put into practical use in recent years often uses a composite material including a Co—Cr—Pt type ferromagnetic alloy mainly composed of Co and nonmagnetic inorganic particles. Furthermore, from the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22C5/04C22C32/00C22C33/02C22C38/00B22F3/10B22F3/14
CPCC23C14/564C22C5/04C22C30/00C22C38/002C22C33/0278C22C2202/02G11B5/82G11B5/851C23C14/3414
Inventor 荻野真一佐藤敦中村祐一郎
Owner JX NIPPON MINING & METALS CORP
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